Shrestha, S.; Parajuli, S.; Park, J.; Yang, H.; Cho, T.-Y.; Eom, J.-H.; Cho, S.-K.; Lim, J.; Cho, G.; Jung, Y.
Improving Stability of Roll-to-Roll (R2R) Gravure-Printed Carbon Nanotube-Based Thin Film Transistors via R2R Plasma-Enhanced Chemical Vapor-Deposited Silicon Nitride. Nanomaterials 2023, 13, 559.
https://doi.org/10.3390/nano13030559
AMA Style
Shrestha S, Parajuli S, Park J, Yang H, Cho T-Y, Eom J-H, Cho S-K, Lim J, Cho G, Jung Y.
Improving Stability of Roll-to-Roll (R2R) Gravure-Printed Carbon Nanotube-Based Thin Film Transistors via R2R Plasma-Enhanced Chemical Vapor-Deposited Silicon Nitride. Nanomaterials. 2023; 13(3):559.
https://doi.org/10.3390/nano13030559
Chicago/Turabian Style
Shrestha, Sagar, Sajjan Parajuli, Jinhwa Park, Hao Yang, Tae-Yeon Cho, Ji-Ho Eom, Seong-Keun Cho, Jongsun Lim, Gyoujin Cho, and Younsu Jung.
2023. "Improving Stability of Roll-to-Roll (R2R) Gravure-Printed Carbon Nanotube-Based Thin Film Transistors via R2R Plasma-Enhanced Chemical Vapor-Deposited Silicon Nitride" Nanomaterials 13, no. 3: 559.
https://doi.org/10.3390/nano13030559
APA Style
Shrestha, S., Parajuli, S., Park, J., Yang, H., Cho, T.-Y., Eom, J.-H., Cho, S.-K., Lim, J., Cho, G., & Jung, Y.
(2023). Improving Stability of Roll-to-Roll (R2R) Gravure-Printed Carbon Nanotube-Based Thin Film Transistors via R2R Plasma-Enhanced Chemical Vapor-Deposited Silicon Nitride. Nanomaterials, 13(3), 559.
https://doi.org/10.3390/nano13030559
