Article Versions Notes

Lee Y, Yeom H, Choi D, Kim S, Lee J, Kim J, Lee H, You S. Database Development of SiO₂ Etching with Fluorocarbon Plasmas Diluted with Various Noble Gases of Ar, Kr, and Xe. Nanomaterials. 2022; 12(21):3828. https://doi.org/10.3390/nano12213828

Lee, Youngseok, Heejung Yeom, Daehan Choi, Sijun Kim, Jangjae Lee, Junghyung Kim, Hyochang Lee, and ShinJae You. 2022. "Database Development of SiO₂ Etching with Fluorocarbon Plasmas Diluted with Various Noble Gases of Ar, Kr, and Xe" Nanomaterials 12, no. 21: 3828. https://doi.org/10.3390/nano12213828

Lee, Y., Yeom, H., Choi, D., Kim, S., Lee, J., Kim, J., Lee, H., & You, S. (2022). Database Development of SiO₂ Etching with Fluorocarbon Plasmas Diluted with Various Noble Gases of Ar, Kr, and Xe. Nanomaterials, 12(21), 3828. https://doi.org/10.3390/nano12213828