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Journal: Appl. Sci., 2019
Volume: 9
Number: 3531
Article:
Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
Authors:
by
Haewon Cho, Namgue Lee, Hyeongsu Choi, Hyunwoo Park, Chanwon Jung, Seokhwi Song, Hyunwoo Yuk, Youngjoon Kim, Jong-Woo Kim, Keunsik Kim, Youngtae Choi, Suhyeon Park, Yurim Kwon and Hyeongtag Jeon
Link:
https://www.mdpi.com/2076-3417/9/17/3531
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