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Journal: Applied SciencesVolume: 9Number: 3531
Article: Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
  • Authors:
  • Haewon Cho1,
  • Namgue Lee2 and
  • Hyeongsu Choi1
  • et al.
Link: https://www.mdpi.com/2076-3417/9/17/3531

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