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Journal: Appl. Sci., 2024
Volume: 14
Number: 7722
7722
Article: POSS and PAG Dual-Containing Chemically Amplified Photoresists by RAFT Polymerization for Enhanced Thermal Performance and Acid Diffusion Inhibition
Authors: by Haimeng Yu, Shaoshuai Liu, Haiyan Fu, Zepeng Cui, Liangshun Zhang and Jia Tian
Link: https://www.mdpi.com/2076-3417/14/17/7722

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