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Journal: Applied SciencesVolume: 14Number: 7722
Article: POSS and PAG Dual-Containing Chemically Amplified Photoresists by RAFT Polymerization for Enhanced Thermal Performance and Acid Diffusion Inhibition
  • Authors:
  • Haimeng Yu†,
  • Shaoshuai Liu† and
  • Jia Tian*
  • et al.
Link: https://www.mdpi.com/2076-3417/14/17/7722

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