Article Versions Notes

Kim GE, Kim H, Woo K, Kang Y, Lee S-H, Jeon Y, Lee MG, Kwon S. Uniform Pressing Mechanism in Large-Area Roll-to-Roll Nanoimprint Lithography Process. Applied Sciences. 2021; 11(20):9571. https://doi.org/10.3390/app11209571

Kim, Ga Eul, Hyuntae Kim, Kyoohee Woo, Yousung Kang, Seung-Hyun Lee, Yongho Jeon, Moon G. Lee, and Sin Kwon. 2021. "Uniform Pressing Mechanism in Large-Area Roll-to-Roll Nanoimprint Lithography Process" Applied Sciences 11, no. 20: 9571. https://doi.org/10.3390/app11209571

Kim, G. E., Kim, H., Woo, K., Kang, Y., Lee, S.-H., Jeon, Y., Lee, M. G., & Kwon, S. (2021). Uniform Pressing Mechanism in Large-Area Roll-to-Roll Nanoimprint Lithography Process. Applied Sciences, 11(20), 9571. https://doi.org/10.3390/app11209571