González-Hernández, A.; Aperador, W.; Flores, M.; Onofre-Bustamante, E.; Bermea, J.E.; Bautista-GarcÃa, R.; Gamboa-Soto, F.
Influence of Deposition Parameters on Structural and Electrochemical Properties of Ti/Ti2N Films Deposited by RF-Magnetron Sputtering. Metals 2022, 12, 1237.
https://doi.org/10.3390/met12081237
AMA Style
González-Hernández A, Aperador W, Flores M, Onofre-Bustamante E, Bermea JE, Bautista-GarcÃa R, Gamboa-Soto F.
Influence of Deposition Parameters on Structural and Electrochemical Properties of Ti/Ti2N Films Deposited by RF-Magnetron Sputtering. Metals. 2022; 12(8):1237.
https://doi.org/10.3390/met12081237
Chicago/Turabian Style
González-Hernández, Andrés, William Aperador, MartÃn Flores, Edgar Onofre-Bustamante, Juan E. Bermea, Roberto Bautista-GarcÃa, and Federico Gamboa-Soto.
2022. "Influence of Deposition Parameters on Structural and Electrochemical Properties of Ti/Ti2N Films Deposited by RF-Magnetron Sputtering" Metals 12, no. 8: 1237.
https://doi.org/10.3390/met12081237
APA Style
González-Hernández, A., Aperador, W., Flores, M., Onofre-Bustamante, E., Bermea, J. E., Bautista-GarcÃa, R., & Gamboa-Soto, F.
(2022). Influence of Deposition Parameters on Structural and Electrochemical Properties of Ti/Ti2N Films Deposited by RF-Magnetron Sputtering. Metals, 12(8), 1237.
https://doi.org/10.3390/met12081237