Abstract
The objective of this paper is to study the issue of the projection uniformity of asymmetric fractional factorials. On the basis of level permutation and mixture discrepancy, the average projection mixture discrepancy to measure the uniformity for low-dimensional projection designs is defined, the uniformity pattern and minimum projection uniformity criterion are presented for evaluating and comparing any asymmetric factorials. Moreover, lower bounds to uniformity pattern have been obtained, and some illustrative examples are also provided.
MSC:
62K15; 62K05; 62K99
1. Introduction
Many criteria were proposed for comparing U-type designs, but none of these criteria can directly distinguish non-isomorphic saturated designs. A special criterion can measure all these subdesigns, and the related values are called its projection pattern. We can use the distribution or the vector of these projection values as a tool to distinguish the underlying designs. Ref. [1] firstly defined the projection discrepancy pattern and proposed the minimum projection uniformity (MPU) criterion, which is equivalent to generalized minimum aberration criterion (GMA [2]). Ref. [3] studied the projection discrepancies of two-level fractional factorials in terms of the centered -discrepancy (CD [4]). Subsequently, ref. [5] discussed the relationships among criteria of MPU proposed in [1] and minimum generalized aberration [6]. Following this projection discrepancy, [7] studied the projection properties of two-level factorials in view of geometry and proposed the uniformity pattern and MPU criterion to assess and compare two-level factorials. The relations between MPU and minimum aberration, and GMA and orthogonality are clarified; this close relationship raises the hope of improving the connection between uniform design theory and factorial design theory.
Following the uniform pattern and MPU, projection uniformity of asymmetric design based on CD and wrap-around -discrepancy (WD [8]) has been studied, respectively. As a measure of uniformity, CD does not have fewer cursed dimensions and WD is not sensitive to a shift for one or more dimensions, Mixture discrepancy (MD [9]) retains the good properties of CD and WD and overcomes the shortcomings of both. Aided by the level permutation technique in [10,11], ref. [12] obtained the relationship between the mean of mixture discrepancies and the generalized word–length pattern for multi-level designs. Ref. [13] defined the MPU criterion for two- and three-level factorials under MD. Refs. [14,15] generalize the findings in [13] to q-level and mixed two- and three-level factorials, respectively. Moreover, ref. [16] proposed the uniform projection design that have the smallest average CD values of all two-dimensional projections and are shown to have good-filling properties over all sub-spaces in terms of the distance, uniformity, and orthogonality. Based on the findings of [16], many applications and studies on uniform projection designs have emerged [17,18,19,20,21,22].
While the work of [13,14,15] discussed the projection uniformity for two-level, three-level, q-level, and mixed two- and three-level designs under MD, respectively, the present paper aims at obtaining further results. We extend the findings in [13,14,15] to general asymmetrical factorials. First, the uniformity pattern and MPU criterion are proposed for selecting asymmetrical designs. Second, we build some analytic linkages between uniformity pattern, orthogonality, and generalized word–length pattern. Third, we integrate two lower bound methods in [23], which can be served as a benchmark for searching MPU designs. Finally, the results of [13,14,15] can be used as our special cases, and some numerical examples are provided to illustrate our theoretical results.
This paper is organized as follows: Section 2 describes some notations and basic concepts such as distance distribution and generalized word–length pattern, which are useful throughout in this paper. Section 3 defines the average projection mixture discrepancy and related uniformity pattern, presents a statistical justification of MPU criterion, and establishes a connection between MPU and GMA. Section 4 provides a lower bound of the uniformity pattern. Some illustrative examples to verify our theoretical results are presented in Section 5.
2. Notations and Preliminaries
Consider a class of U-type designs, denoted by , of mixed - and -level factorials in n runs and factors, where each factor of the first factors takes values from a set of equally often and each factor of the last factors takes values from a set of equally often. For any design , a typical treatment combination (or run) of design d is defined by , where, for , , and . Denote , where , . If all the possible level combinations corresponding to any columns of design d appear equally often, , , design d is called to be an orthogonal array of strength t and denoted by .
For any design , its distance distribution is defined by
where is the cardinality of the set , is the Hamming distance between two runs i and k of design , , , .
The MacWilliams transforms of the of any design are defined as
where is the Krawtchouk polynomial, and for .
Ref. [2] showed that the generalized word–length pattern is the MacWilliams transform of the distance distribution, that is,
where the vector is called the generalized word–length pattern. For any two designs and in , is said to have less aberration than if there exists a positive integer , such that and for . The design has generalized minimum aberration if there is no other design with less aberration than .
For any positive integer , defined , and for any , let be the set of all nonempty subsets of with the first elements from and the next elements from . For any g, , let be the set of all nonempty subsets of with cardinality g, it is to be noted that .
For any design , define the nonempty set and , let be the corresponding projection design of d onto factors with indexes from u. A typical treatment combination of is represented as , where , , . Let be the Hamming distance between two runs and of the projection design , denote as the coincide number between two runs and , where and .
3. Projection Uniformity of
For any design , and , let be the mixture discrepancy value of the corresponding projection design ; following [9], we can derive the below formula for ,
where , , i, .
When considering all possible level permutations for every factor of , there are combinatorially isomorphic designs of d that can be obtained, and denote the set of these designs as . Similarly, for any positive integer and , we can obtain combinatorially isomorphic designs of ; the corresponding set of these combinatorially isomorphic designs is denoted by . The mean of projection mixture discrepancies of all the designs in is denoted by , that is,
The following lemma, which can be proved similarly as [14,15], gives the expression for .
Lemma 1.
For any design , and ,
when both and are even,
when both and are odd,
when is even and is odd,
We can obtain the following lemma when the design d is an orthogonal array .
Lemma 2.
Suppose design d is an orthogonal array , then
where , , is a constant only depending on and . In particular,
when both and are even,
when both and are odd,
when is even and is odd,
It is well known that strength is an important measure of orthogonality. For comparing the difference between design and orthogonal array of strength t, the definition of uniformity pattern of design d is given as follows, which provides a measure of the projection uniformity of d onto different dimensions.
Definition 1.
For any design , any positive integer and , define
where is shown in Lemma 2. The vector is called the uniformity pattern of design d.
We now state the above discussion as the following theorem, which gives a relationship between the uniformity pattern of design d and the strength t of orthogonal array .
Theorem 1.
For any design , design d is an orthogonal array if and only if for and .
Theorem 1 indicates that there is a close relationship between and strength t for a design , that is, the smaller the value of , the design d will be closer to an orthogonal array of strength t. Based on Theorem 1, may be used as a measure for evaluating designs; it suggests to define some similar criteria, such as MPU.
Definition 2.
For two designs , there is an integer t such that and for ; then, is said to have less MPU than . If there is no other design in that has less MPU than , then is said to have MPU, or is an MPU design.
Here, we mainly establish the connections between projection uniformity and orthogonality, and some relationships between criteria of MPU and GMA will also be included.
Theorem 2.
For any design , any positive integer and , we have
where , and
when both and are even,
when both and are odd,
when is even and is odd,
4. A Lower Bound of Uniformity Pattern
This section provides a lower bound of uniformity pattern defined in Definition 1. It is very important that the lower bounds of uniformity pattern can be served as a benchmark not only in searching for uniform designs with minimum projection uniformity but also in helping to validate that some good designs are in fact uniform.
Define when , and when .
Theorem 3.
For any design and positive integer , we have
when both and are even,
where ;
when both and are odd,
where ;
when is even and is odd,
where .
Theorem 4.
For any design and positive integer ,
when both and are even,
when both and are odd,
when is even and is odd,
where , be the largest integer contained in .
Note that Theorem 3 is based on Hamming distances between any two runs of d, but Theorem 4 comes from the quadratic form in Appendix A Equation (A1). Some numerical examples show that these two lower bounds are not tight simultaneously. Therefore, we give another lower bound of uniformity pattern as the following theorem:
Theorem 5.
For any design and positive integer , we have
where .
5. Illustrative Examples
In this section, some numerical examples are provided to illustrate our theoretical results.
Example 1.
Consider a design , which are given below:
The number of columns in design is greater than the number of rows, its uniformity pattern in Definition 1, and its lower bound values in Theorems 3–5 are listed in Table 1.
Table 1.
Numerical results of designs .
It is clear that is an orthogonal array of strength 1 and attains the lower bounds in Theorem 3.
Example 2.
Consider design and , which are given below,
The number of rows in designs and are greater than the number of columns, and the numerical results of both are shown in Table 2.
Table 2.
Numerical results of designs and .
As can be seen from Table 2, designs and are an orthogonal array with strengths of 2 and 4, respectively, and both reach the lower bound in Theorem 4.
It can be seen from Table 1 and Table 2 that the lower bounds of uniformity pattern of designs , , and are achieved, so , , and are all MPU designs. We can also see that is better than for large n and smaller s. Similar to the findings of Fang et al. (2018) [24], none of the lower bounds in Theorems 3 and 4 are absolutely dominant for all combinations of the number of runs n and of factors s. Therefore, we choose the maximum value of Theorems 3–5.
6. Conclusions
In this paper, the projection uniformity and related properties under mixture discrepancy of asymmetric factorials are explored. The relationship between uniformity pattern and generalized minimum aberration is established. A lower bound of uniformity pattern is also obtained, which can be served as a benchmark for searching minimum projection uniformity designs. These results provide a theoretical basis for searching optimal asymmetric designs with minimum projection uniformity measured by average projection mixture discrepancy. Overall, this paper extends the results of [13,14,15] to the asymmetric case, which makes the corresponding theory more flexible.
The results in this paper can be extended to any asymmetric designs . Taking the first t factors as even and the last factors as odd, and using some simple calculation of tired multiplication, similar definition and results of uniformity pattern and lower bounds can be obtained.
Author Contributions
Conceptualization, Z.O. and K.W.; methodology, N.Z.; software, K.W. and N.Z.; validation, N.Z. and K.W.; resources, H.Q.; data curation, N.Z. and K.W.; writing—original draft preparation, K.W.; writing—review and editing, H.Q., N.Z., and Z.O.; funding acquisition, H.Q. and Z.O. All authors have read and agreed to the published version of the manuscript.
Funding
This research was funded by the National Natural Science Foundation of China (Grant Nos. 11871237, 11961027, 12161040, 11701213), the Natural Science Foundation of Hunan Provincial (Grant Nos. 2021JJ30550, 2020JJ4497), the Scientific Research Plan Item of Hunan Provincial Department of Education (Grant No. 22A0355), and the Discipline Coordination Construction Project of Zhongnan University of Economics and Law (Grant No. XKHJ202125).
Institutional Review Board Statement
Not applicable.
Informed Consent Statement
Not applicable.
Data Availability Statement
Data are contained within the article.
Conflicts of Interest
The authors have no conflict of interest regarding this paper.
Appendix A
Proof of Lemma 2.
If a design is an orthogonal array of strength t; then, for any nonnegative integer and , all possible level combinations among any g columns of projection design appear equally often. Given row , it is easy to obtain that .
Therefore, the third term in the right side of Formula (4) can be expressed as
which completes the proof. □
Proof of Theorem 2.
In order to prove Theorem 3, we need to know Lemmas A1–A3, where Lemma A1 can be obtained from Lemma 1 and Definition 1.
Lemma A1.
For any design , positive integer and ,
when both and are even,
where is shown in Theorem 3,
when both and are odd,
where is shown in Theorem 3,
when is even and is odd,
where is shown in Theorem 3, .
The proof of Lemma A1 is similar to [14], so it is omitted.
Lemma A2
([25]). For any design and positive integer t, we have
where , P and Q are integers such that , and means the largest integer contained in A.
Lemma A3
([26]). For any design and positive integer t, we have
where and are weights, and are integers such that and , and are integers such that and . Let , , , , , .
Proof of Theorem 4.
According to [23,24], let and respectively be the identity matrix and the vector with all elements unity, define
Let and be the -fold and -fold Kronecker products of and , respectively. Let be the set of all binary tuples, be the set of consisting of those binary -tuples with exactly elements of unity and elements of unity, respectively, where .
For any design , Lemma A1 gives an expression between the uniformity pattern and the number of coincide. Based on this, we can obtain
when both and are even,
when both and are odd,
when is even and is odd,
Considering the case where is even and is odd, we have
where
and .
Let be the number of times the treatment combination x occurs in d and be the vector with elements arranged in the lexicographic order. For any , the elements of the vector are nonnegative integers with sum n; then, by [24], we have
which completes the proof of Case .
The proof of Case and Case are similar to Case . □
References
- Hickernell, F.J.; Liu, M.Q. Uniformity designs limit aliasing. Biometrika 2002, 89, 893–904. [Google Scholar] [CrossRef]
- Xu, H.Q.; Wu, C.F.J. Generalized minimum aberration for asymmetrical fractional factorial designs. Ann. Stat. 2001, 29, 1066–1077. [Google Scholar]
- Ma, C.X.; Fang, K.T.; Lin, D.K.J. A note on uniformity and orthogonality. J. Stat. Plan. Inference 2003, 113, 323–334. [Google Scholar] [CrossRef]
- Hickernell, F.J. A generalized discrepancy and quadrature error bound. Math. Comput. 1998, 67, 299–322. [Google Scholar] [CrossRef]
- Liu, M.Q.; Fang, K.T.; Hickernell, F.J. Connections among different criteria for asymmetrical fractional factorial designs. Stat. Sin. 2006, 16, 1285–1297. [Google Scholar]
- Ma, C.X.; Fang, K.T. A note on generalized aberration factorial designs. Metrika 2001, 53, 85–93. [Google Scholar] [CrossRef]
- Fang, K.T.; Qin, H. Uniformity pattern and related criteria for two-level factorials. Sci. China Ser. Math. 2005, 48, 1–11. [Google Scholar] [CrossRef]
- Hickernell, F.J. Lattice rules: How well do they measure up? In Random and Quasi-Random Point Sets; Hellekalek, P., Larcher, G., Eds.; Springer: New York, NY, USA, 1998; pp. 106–166. [Google Scholar]
- Zhou, Y.D.; Fang, K.T.; Ning, J.H. Mixture discrepancy for quasi-random point sets. J. Complex. 2013, 29, 283–301. [Google Scholar] [CrossRef]
- Tang, Y.; Xu, H.Q.; Lin, D.K.J. Uniform fractional factorial designs. Ann. Stat. 2012, 40, 891–907. [Google Scholar] [CrossRef]
- Zhou, Y.D.; Xu, H.Q. Space-filling fractional factorial designs. J. Am. Stat. Assoc. 2014, 109, 1134–1144. [Google Scholar] [CrossRef]
- Chen, W.; Qi, Z.F.; Zhou, Y.D. Constructing uniformity designs under mixture discrepancy. Stat. Probab. Lett. 2015, 97, 76–82. [Google Scholar] [CrossRef]
- Yi, S.Y.; Zhou, Y.D. Projection uniformity under mixture discrepancy. Stat. Probab. Lett. 2018, 140, 96–105. [Google Scholar] [CrossRef]
- Wang, K.; Ou, Z.J.; Liu, J.Q.; Li, H.Y. Uniformity pattern of q-level factorials under mixture discrepancy. Stat. Pap. 2021, 62, 1777–1793. [Google Scholar] [CrossRef]
- Wang, K.; Qin, H.; Ou, Z.J. Uniformity pattern of mixed two-and three-level factorials under average projection mixture discrepancy. Statistics 2022, 56, 121–133. [Google Scholar] [CrossRef]
- Sun, F.S.; Wang, Y.P.; Xu, H.Q. Uniform projection designs. Ann. Stat. 2019, 47, 641–661. [Google Scholar] [CrossRef]
- Chen, H.; Zhang, Y.; Yang, X. Uniform projection nested Latin hypercube designs. Stat. Pap. 2021, 62, 2031–2045. [Google Scholar] [CrossRef]
- Liu, S.X.; Wang, Y.P.; Sun, F.S. Two-dimensional projection uniformity for space-filling designs. Can. J. Stat. 2022. [Google Scholar] [CrossRef]
- Li, W.L.; Liu, M.Q.; Yang, J.F. Construction of column-orthogonal strong orthogonal arrays. Stat. Pap. 2022, 63, 515–530. [Google Scholar] [CrossRef]
- Sun, C.Y.; Tang, B.X. Uniform projection designs and strong orthogonal arrays. J. Am. Stat. Assoc. 2021. [Google Scholar] [CrossRef]
- Wang, Y.P.; Sun, F.S.; Xu, H.Q. On Design Orthogonality, Maximin Distance, and Projection Uniformity for Computer Experiments. J. Am. Stat. Assoc. 2022, 117, 375–385. [Google Scholar] [CrossRef]
- Zhou, Y.S.; Xiao, Q.; Sun, F.S. Construction of uniform projection designs via level permutation and expansion. J. Stat. Plan. Inference 2023, 222, 209–225. [Google Scholar] [CrossRef]
- Chatterjee, K.; Li, Z.H.; Qin, H. Some new lower bounds to centered and wrap-round L2-discrepancies. Stat. Probab. Lett. 2012, 82, 1367–1373. [Google Scholar] [CrossRef]
- Fang, K.T.; Liu, M.Q.; Qin, H.; Zhou, Y.D. Theory and Application of Uniform Experimental Designs; Springer: Singapore, 2018. [Google Scholar]
- Zhang, Q.H.; Wang, Z.H.; Hu, J.W.; Qin, H. A new lower bound for wrap-around L2-discrepancy on two and three mixed level factorials. Stat. Probab. Lett. 2015, 96, 133–140. [Google Scholar] [CrossRef]
- Fang, K.T.; Ma, C.X.; Mukerjee, R. Uniformity in Fractional Factorials. In Monte Carlo and Quasi-Monte Carlo Methods; Springer: Berlin/Heidelberg, Germany, 2002; pp. 232–241. [Google Scholar]
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