Cha, B.J.; Woo, T.G.; Han, S.W.; Saqlain, S.; Seo, H.O.; Cho, H.K.; Kim, J.Y.; Kim, Y.D.
Surface Modification of TiO2 for Obtaining High Resistance against Poisoning during Photocatalytic Decomposition of Toluene. Catalysts 2018, 8, 500.
https://doi.org/10.3390/catal8110500
AMA Style
Cha BJ, Woo TG, Han SW, Saqlain S, Seo HO, Cho HK, Kim JY, Kim YD.
Surface Modification of TiO2 for Obtaining High Resistance against Poisoning during Photocatalytic Decomposition of Toluene. Catalysts. 2018; 8(11):500.
https://doi.org/10.3390/catal8110500
Chicago/Turabian Style
Cha, Byeong Jun, Tae Gyun Woo, Sang Wook Han, Shahid Saqlain, Hyun Ook Seo, Hong Kwan Cho, Jee Yong Kim, and Young Dok Kim.
2018. "Surface Modification of TiO2 for Obtaining High Resistance against Poisoning during Photocatalytic Decomposition of Toluene" Catalysts 8, no. 11: 500.
https://doi.org/10.3390/catal8110500
APA Style
Cha, B. J., Woo, T. G., Han, S. W., Saqlain, S., Seo, H. O., Cho, H. K., Kim, J. Y., & Kim, Y. D.
(2018). Surface Modification of TiO2 for Obtaining High Resistance against Poisoning during Photocatalytic Decomposition of Toluene. Catalysts, 8(11), 500.
https://doi.org/10.3390/catal8110500