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Journal: MicromachinesVolume: 11Number: 88
Article: Role of a 193 nm ArF Excimer Laser in Laser-Assisted Plasma-Enhanced Chemical Vapor Deposition of SiNx for Low Temperature Thin Film Encapsulation
- Authors:
- Kunsik An1,
- Ho-Nyun Lee2 and
- Kwan Hyun Cho1
- et al.
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