Mochalov, L.A.; Telegin, S.V.; Almaev, A.V.; Slapovskaya, E.A.; Yunin, P.A.
Structural and Electrically Conductive Properties of Plasma-Enhanced Chemical-Vapor-Deposited High-Resistivity Zn-Doped β-Ga2O3 Thin Films. Micromachines 2025, 16, 954.
https://doi.org/10.3390/mi16080954
AMA Style
Mochalov LA, Telegin SV, Almaev AV, Slapovskaya EA, Yunin PA.
Structural and Electrically Conductive Properties of Plasma-Enhanced Chemical-Vapor-Deposited High-Resistivity Zn-Doped β-Ga2O3 Thin Films. Micromachines. 2025; 16(8):954.
https://doi.org/10.3390/mi16080954
Chicago/Turabian Style
Mochalov, Leonid A., Sergey V. Telegin, Aleksei V. Almaev, Ekaterina A. Slapovskaya, and Pavel A. Yunin.
2025. "Structural and Electrically Conductive Properties of Plasma-Enhanced Chemical-Vapor-Deposited High-Resistivity Zn-Doped β-Ga2O3 Thin Films" Micromachines 16, no. 8: 954.
https://doi.org/10.3390/mi16080954
APA Style
Mochalov, L. A., Telegin, S. V., Almaev, A. V., Slapovskaya, E. A., & Yunin, P. A.
(2025). Structural and Electrically Conductive Properties of Plasma-Enhanced Chemical-Vapor-Deposited High-Resistivity Zn-Doped β-Ga2O3 Thin Films. Micromachines, 16(8), 954.
https://doi.org/10.3390/mi16080954