Yoon, S.; Oh, S.; Lee, G.; Kim, Y.; Kim, S.; Park, J.-H.; Shin, M.; Jeon, D.-W.; Yoo, G.
Enhanced UVC Responsivity of Heteroepitaxial α-Ga2O3 Photodetector with Ultra-Thin HfO2 Interlayer. Micromachines 2025, 16, 836.
https://doi.org/10.3390/mi16070836
AMA Style
Yoon S, Oh S, Lee G, Kim Y, Kim S, Park J-H, Shin M, Jeon D-W, Yoo G.
Enhanced UVC Responsivity of Heteroepitaxial α-Ga2O3 Photodetector with Ultra-Thin HfO2 Interlayer. Micromachines. 2025; 16(7):836.
https://doi.org/10.3390/mi16070836
Chicago/Turabian Style
Yoon, SiSung, SeungYoon Oh, GyuHyung Lee, YongKi Kim, SunJae Kim, Ji-Hyeon Park, MyungHun Shin, Dae-Woo Jeon, and GeonWook Yoo.
2025. "Enhanced UVC Responsivity of Heteroepitaxial α-Ga2O3 Photodetector with Ultra-Thin HfO2 Interlayer" Micromachines 16, no. 7: 836.
https://doi.org/10.3390/mi16070836
APA Style
Yoon, S., Oh, S., Lee, G., Kim, Y., Kim, S., Park, J.-H., Shin, M., Jeon, D.-W., & Yoo, G.
(2025). Enhanced UVC Responsivity of Heteroepitaxial α-Ga2O3 Photodetector with Ultra-Thin HfO2 Interlayer. Micromachines, 16(7), 836.
https://doi.org/10.3390/mi16070836
