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Journal: Micromachines, 2024
Volume: 15
Number: 1408
Article:
An Improved Algorithm to Extract Moiré Fringe Phase for Wafer-Mask Alignment in Nanoimprint Lithography
Authors:
by
Feifan Xu, Yinye Ding, Wenhao Chen and Haojie Xia
Link:
https://www.mdpi.com/2072-666X/15/12/1408
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