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Journal: Micromachines, 2024
Volume: 15
Number: 1408

Article: An Improved Algorithm to Extract Moiré Fringe Phase for Wafer-Mask Alignment in Nanoimprint Lithography
Authors: by Feifan Xu, Yinye Ding, Wenhao Chen and Haojie Xia
Link: https://www.mdpi.com/2072-666X/15/12/1408

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