Lin, S.-C.; Wang, C.-C.; Tien, C.-L.; Tung, F.-C.; Wang, H.-F.; Lai, S.-H.
Fabrication of Aluminum Oxide Thin-Film Devices Based on Atomic Layer Deposition and Pulsed Discrete Feed Method. Micromachines 2023, 14, 279.
https://doi.org/10.3390/mi14020279
AMA Style
Lin S-C, Wang C-C, Tien C-L, Tung F-C, Wang H-F, Lai S-H.
Fabrication of Aluminum Oxide Thin-Film Devices Based on Atomic Layer Deposition and Pulsed Discrete Feed Method. Micromachines. 2023; 14(2):279.
https://doi.org/10.3390/mi14020279
Chicago/Turabian Style
Lin, Shih-Chin, Ching-Chiun Wang, Chuen-Lin Tien, Fu-Ching Tung, Hsuan-Fu Wang, and Shih-Hsiang Lai.
2023. "Fabrication of Aluminum Oxide Thin-Film Devices Based on Atomic Layer Deposition and Pulsed Discrete Feed Method" Micromachines 14, no. 2: 279.
https://doi.org/10.3390/mi14020279
APA Style
Lin, S.-C., Wang, C.-C., Tien, C.-L., Tung, F.-C., Wang, H.-F., & Lai, S.-H.
(2023). Fabrication of Aluminum Oxide Thin-Film Devices Based on Atomic Layer Deposition and Pulsed Discrete Feed Method. Micromachines, 14(2), 279.
https://doi.org/10.3390/mi14020279