Zhang, H.; Wang, Y.; Wang, L.; Liu, Y.; Chen, H.; Wu, Z.
Process Control Monitor (PCM) for Simultaneous Determination of the Piezoelectric Coefficients d31 and d33 of AlN and AlScN Thin Films. Micromachines 2022, 13, 581.
https://doi.org/10.3390/mi13040581
AMA Style
Zhang H, Wang Y, Wang L, Liu Y, Chen H, Wu Z.
Process Control Monitor (PCM) for Simultaneous Determination of the Piezoelectric Coefficients d31 and d33 of AlN and AlScN Thin Films. Micromachines. 2022; 13(4):581.
https://doi.org/10.3390/mi13040581
Chicago/Turabian Style
Zhang, Hao, Yang Wang, Lihao Wang, Yichen Liu, Hao Chen, and Zhenyu Wu.
2022. "Process Control Monitor (PCM) for Simultaneous Determination of the Piezoelectric Coefficients d31 and d33 of AlN and AlScN Thin Films" Micromachines 13, no. 4: 581.
https://doi.org/10.3390/mi13040581
APA Style
Zhang, H., Wang, Y., Wang, L., Liu, Y., Chen, H., & Wu, Z.
(2022). Process Control Monitor (PCM) for Simultaneous Determination of the Piezoelectric Coefficients d31 and d33 of AlN and AlScN Thin Films. Micromachines, 13(4), 581.
https://doi.org/10.3390/mi13040581