Deuerling, J.; Keck, S.; Moelyadi, I.; Repke, J.-U.; Rädle, M.
In-Line Analysis of Diffusion Processes in Micro Channels by Long Distance Raman Photometric Measurement Technology—A Proof of Concept Study. Micromachines 2021, 12, 116.
https://doi.org/10.3390/mi12020116
AMA Style
Deuerling J, Keck S, Moelyadi I, Repke J-U, Rädle M.
In-Line Analysis of Diffusion Processes in Micro Channels by Long Distance Raman Photometric Measurement Technology—A Proof of Concept Study. Micromachines. 2021; 12(2):116.
https://doi.org/10.3390/mi12020116
Chicago/Turabian Style
Deuerling, Julian, Shaun Keck, Inasya Moelyadi, Jens-Uwe Repke, and Matthias Rädle.
2021. "In-Line Analysis of Diffusion Processes in Micro Channels by Long Distance Raman Photometric Measurement Technology—A Proof of Concept Study" Micromachines 12, no. 2: 116.
https://doi.org/10.3390/mi12020116
APA Style
Deuerling, J., Keck, S., Moelyadi, I., Repke, J.-U., & Rädle, M.
(2021). In-Line Analysis of Diffusion Processes in Micro Channels by Long Distance Raman Photometric Measurement Technology—A Proof of Concept Study. Micromachines, 12(2), 116.
https://doi.org/10.3390/mi12020116