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Open AccessArticle

Influence of N2 Partial Pressure on Structure and Mechanical Properties of TiAlN/Al2O3 Multilayers

College of Physics and Electronic Information Science, Tianjin Normal University, Tianjin 300387, China
Key Laboratory of Beam Technology and Material Modification of Ministry of Education, Beijing Normal University, Beijing 100875, China
Author to whom correspondence should be addressed.
Materials 2013, 6(3), 795-804;
Received: 31 December 2012 / Revised: 22 February 2013 / Accepted: 22 February 2013 / Published: 28 February 2013
(This article belongs to the Special Issue Advances in Multifunctional Materials)
TiAlN/Al2O3 multilayers with different Ar/N2 ratios were deposited on Si substrates in different N2 partial pressure by magnetron sputtering. The crystalline and multilayer structures of the multilayers were determined by a glancing angle X-ray diffractometer (XRD). A nanoindenter was used to evaluate the hardness, the elastic modulus and scratch scan of the multilayers. The chemical bonding was investigated by a X-ray Photoelectron Spectroscopy (XPS). The maximum hardness (36.3 GPa) and elastic modulus (466 GPa) of the multilayers was obtained when Ar/N2 ratio was 18:1. The TiAlN/Al2O3 multilayers were crystallized with orientation in the (111) and (311) crystallographic planes. The multilayers displayed stably plastic recovery in different Ar/N2 ratios. The scratch scan and post scan surface profiles of TiAlN/Al2O3 multilayers showed the highest critical fracture load (Lc) of 53 mN for the multilayer of Ar/N2 = 18:1. It indicated that the multilayer had better practical adhesion strength and fracture resistance. View Full-Text
Keywords: TiAlN/Al2O3 multilayers; magnetron sputtering; hardness; residual stress TiAlN/Al2O3 multilayers; magnetron sputtering; hardness; residual stress
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Yan, J.; Dong, L.; Gao, C.; Wang, N.; Li, D. Influence of N2 Partial Pressure on Structure and Mechanical Properties of TiAlN/Al2O3 Multilayers. Materials 2013, 6, 795-804.

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