Puźniak, M.; Gajewski, W.; Seweryn, A.; Klepka, M.T.; Witkowski, B.S.; Godlewski, M.; Mroczyński, R.
Studies of Electrical Parameters and Thermal Stability of HiPIMS Hafnium Oxynitride (HfOxNy) Thin Films. Materials 2023, 16, 2539.
https://doi.org/10.3390/ma16062539
AMA Style
Puźniak M, Gajewski W, Seweryn A, Klepka MT, Witkowski BS, Godlewski M, Mroczyński R.
Studies of Electrical Parameters and Thermal Stability of HiPIMS Hafnium Oxynitride (HfOxNy) Thin Films. Materials. 2023; 16(6):2539.
https://doi.org/10.3390/ma16062539
Chicago/Turabian Style
Puźniak, Mirosław, Wojciech Gajewski, Aleksandra Seweryn, Marcin T. Klepka, Bartłomiej S. Witkowski, Marek Godlewski, and Robert Mroczyński.
2023. "Studies of Electrical Parameters and Thermal Stability of HiPIMS Hafnium Oxynitride (HfOxNy) Thin Films" Materials 16, no. 6: 2539.
https://doi.org/10.3390/ma16062539
APA Style
Puźniak, M., Gajewski, W., Seweryn, A., Klepka, M. T., Witkowski, B. S., Godlewski, M., & Mroczyński, R.
(2023). Studies of Electrical Parameters and Thermal Stability of HiPIMS Hafnium Oxynitride (HfOxNy) Thin Films. Materials, 16(6), 2539.
https://doi.org/10.3390/ma16062539