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Journal: MaterialsVolume: 16Number: 5043
Article: On Relationships between Plasma Chemistry and Surface Reaction Kinetics Providing the Etching of Silicon in CF4, CHF3, and C4F8 Gases Mixed with Oxygen
  • Authors:
  • Seung Yong Baek1,
  • Alexander Efremov2 and
  • Alexander Bobylev2
  • et al.
Link: https://www.mdpi.com/1996-1944/16/14/5043

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