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Journal: Materials, 2023
Volume: 16
Number: 5043

Article: On Relationships between Plasma Chemistry and Surface Reaction Kinetics Providing the Etching of Silicon in CF4, CHF3, and C4F8 Gases Mixed with Oxygen
Authors: by Seung Yong Baek, Alexander Efremov, Alexander Bobylev, Gilyoung Choi and Kwang-Ho Kwon
Link: https://www.mdpi.com/1996-1944/16/14/5043

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