Huang, P.-H.; Zhang, Z.-X.; Hsu, C.-H.; Wu, W.-Y.; Huang, C.-J.; Lien, S.-Y.
Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition. Materials 2021, 14, 690.
https://doi.org/10.3390/ma14030690
AMA Style
Huang P-H, Zhang Z-X, Hsu C-H, Wu W-Y, Huang C-J, Lien S-Y.
Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition. Materials. 2021; 14(3):690.
https://doi.org/10.3390/ma14030690
Chicago/Turabian Style
Huang, Pao-Hsun, Zhi-Xuan Zhang, Chia-Hsun Hsu, Wan-Yu Wu, Chien-Jung Huang, and Shui-Yang Lien.
2021. "Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition" Materials 14, no. 3: 690.
https://doi.org/10.3390/ma14030690
APA Style
Huang, P.-H., Zhang, Z.-X., Hsu, C.-H., Wu, W.-Y., Huang, C.-J., & Lien, S.-Y.
(2021). Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition. Materials, 14(3), 690.
https://doi.org/10.3390/ma14030690