Lauxen, A.I.; Kobauri, P.; Wegener, M.; Hansen, M.J.; Galenkamp, N.S.; Maglia, G.; Szymanski, W.; Feringa, B.L.; Kuipers, O.P.
Mechanism of Resistance Development in E. coli against TCAT, a Trimethoprim-Based Photoswitchable Antibiotic. Pharmaceuticals 2021, 14, 392.
https://doi.org/10.3390/ph14050392
AMA Style
Lauxen AI, Kobauri P, Wegener M, Hansen MJ, Galenkamp NS, Maglia G, Szymanski W, Feringa BL, Kuipers OP.
Mechanism of Resistance Development in E. coli against TCAT, a Trimethoprim-Based Photoswitchable Antibiotic. Pharmaceuticals. 2021; 14(5):392.
https://doi.org/10.3390/ph14050392
Chicago/Turabian Style
Lauxen, Anna I., Piermichele Kobauri, Michael Wegener, Mickel J. Hansen, Nicole S. Galenkamp, Giovanni Maglia, Wiktor Szymanski, Ben L. Feringa, and Oscar P. Kuipers.
2021. "Mechanism of Resistance Development in E. coli against TCAT, a Trimethoprim-Based Photoswitchable Antibiotic" Pharmaceuticals 14, no. 5: 392.
https://doi.org/10.3390/ph14050392
APA Style
Lauxen, A. I., Kobauri, P., Wegener, M., Hansen, M. J., Galenkamp, N. S., Maglia, G., Szymanski, W., Feringa, B. L., & Kuipers, O. P.
(2021). Mechanism of Resistance Development in E. coli against TCAT, a Trimethoprim-Based Photoswitchable Antibiotic. Pharmaceuticals, 14(5), 392.
https://doi.org/10.3390/ph14050392