Sikora, A.; Gajewski, K.; Badura, D.; Pruchnik, B.; Piasecki, T.; Raczkowski, K.; Gotszalk, T.
Conductive Atomic Force Microscopy—Ultralow-Current Measurement Systems for Nanoscale Imaging of a Surface’s Electrical Properties. Sensors 2024, 24, 5649.
https://doi.org/10.3390/s24175649
AMA Style
Sikora A, Gajewski K, Badura D, Pruchnik B, Piasecki T, Raczkowski K, Gotszalk T.
Conductive Atomic Force Microscopy—Ultralow-Current Measurement Systems for Nanoscale Imaging of a Surface’s Electrical Properties. Sensors. 2024; 24(17):5649.
https://doi.org/10.3390/s24175649
Chicago/Turabian Style
Sikora, Andrzej, Krzysztof Gajewski, Dominik Badura, Bartosz Pruchnik, Tomasz Piasecki, Kamil Raczkowski, and Teodor Gotszalk.
2024. "Conductive Atomic Force Microscopy—Ultralow-Current Measurement Systems for Nanoscale Imaging of a Surface’s Electrical Properties" Sensors 24, no. 17: 5649.
https://doi.org/10.3390/s24175649
APA Style
Sikora, A., Gajewski, K., Badura, D., Pruchnik, B., Piasecki, T., Raczkowski, K., & Gotszalk, T.
(2024). Conductive Atomic Force Microscopy—Ultralow-Current Measurement Systems for Nanoscale Imaging of a Surface’s Electrical Properties. Sensors, 24(17), 5649.
https://doi.org/10.3390/s24175649