Zhao, B.; Shi, W.; Zhang, J.; Zhang, M.; Qi, X.; Li, J.; Li, F.; Tan, J.
Six Degrees of Freedom Displacement Measurement System for Wafer Stage Composed of Hall Sensors. Sensors 2018, 18, 2030.
https://doi.org/10.3390/s18072030
AMA Style
Zhao B, Shi W, Zhang J, Zhang M, Qi X, Li J, Li F, Tan J.
Six Degrees of Freedom Displacement Measurement System for Wafer Stage Composed of Hall Sensors. Sensors. 2018; 18(7):2030.
https://doi.org/10.3390/s18072030
Chicago/Turabian Style
Zhao, Bo, Weijia Shi, Jiawei Zhang, Ming Zhang, Xue Qi, Jiaxin Li, Feng Li, and Jiubin Tan.
2018. "Six Degrees of Freedom Displacement Measurement System for Wafer Stage Composed of Hall Sensors" Sensors 18, no. 7: 2030.
https://doi.org/10.3390/s18072030
APA Style
Zhao, B., Shi, W., Zhang, J., Zhang, M., Qi, X., Li, J., Li, F., & Tan, J.
(2018). Six Degrees of Freedom Displacement Measurement System for Wafer Stage Composed of Hall Sensors. Sensors, 18(7), 2030.
https://doi.org/10.3390/s18072030