Search Results (782)

Grain boundaries are among the most influential structural features that control the charge transport in polycrystalline organic semiconductors. Acting as both charge trapping sites and electrostatic barriers, they disrupt molecular packing and introduce energetic disorder, thereby limiting carrier mobility, increasing threshold voltage, and degrading the stability of organic thin-film transistors (OTFTs). This review presents a detailed discussion of grain boundary formation, their impact on charge transport, and experimental strategies for engineering their structure and distribution across several high-mobility small-molecule semiconductors, including pentacene, TIPS pentacene, diF-TES-ADT, and rubrene. We explore grain boundary engineering approaches through solvent design, polymer additives, and external alignment methods that modulate crystallization dynamics and domain morphology. Then various case studies are discussed to demonstrate that optimized processing can yield larger, well-aligned grains with reduced boundary effects, leading to great mobility enhancements and improved device stability. By offering insights from structural characterization, device physics, and materials processing, this review outlines key directions for grain boundary control, which is essential for advancing the performance and stability of organic electronic devices. Full article

During the last few years, the requirements for highly efficient, sustainable, and versatile materials in modern biomedicine, aircraft and aerospace industries, automotive production, and electronic and electrical engineering applications have increased. This has led to the development of new and innovative methods for material modification and optimization. This can be achieved in many different ways, but one such approach is the application of surface thin films. They can be conductive (metallic), semi-conductive (metal-ceramic), or isolating (polymeric). Special emphasis is placed on applying semi-conductive thin films due to their unique properties, be it electrical, chemical, mechanical, or other. The particular thin films of interest are composite ones of the type of transition metal oxide (TMO) and transition metal nitride (TMN), due to their widespread configurations and applications. Regardless of the countless number of studies regarding the application of such films in the aforementioned industrial fields, some further possible investigations are necessary to find optimal solutions for modern problems in this topic. One such problem is the possibility of characterization of the applied thin films, not via textbook approaches, but through a simple, modern solution using their electrical properties. This can be achieved on the basis of measuring the films’ electrical impedance, since all different semi-conductive materials have different impedance values. However, this is a huge practical work that necessitates the collection of a large pool of data and needs to be based on well-established methods for both characterization and formation of the films. A thorough review on the topic of applying thin films using physical vapor deposition techniques (PVD) in the field of different modern applications, and the current results of such investigations are presented. Furthermore, current research regarding the possible methods for applying such films, and the specifics behind them, need to be summarized. Due to this, in the present work, the specifics of applying thin films using PVD methods and their expected structure and properties were evaluated. Special emphasis was paid to the electrical impedance spectroscopy (EIS) method, which is typically used for the investigation and characterization of electrical systems. This method has increased in popularity over the last few years, and its applicability in the characterization of electrical systems that include thin films formed using PVD methods was proven many times over. However, a still lingering question is the applicability of this method for backwards engineering of thin films. Currently, the EIS method is used in combination with traditional techniques such as X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), energy-dispersive X-ray spectroscopy (EDX), and others. There is, however, a potential to predict the structure and properties of thin films using purely a combination of EIS measurements and complex theoretical models. The current progress in the development of the EIS measurement method was described in the present work, and the trend is such that new theoretical models and new practical testing knowledge was obtained that help implement the method in the field of thin films characterization. Regardless of this progress, much more future work was found to be necessary, in particular, practical measurements (real data) of a large variety of films, in order to build the composition–structure–properties relationship. Full article

Indium-based oxide semiconductors have been commercialized because of their excellent electrical properties, but the high cost, limited availability, and environmental toxicity of indium necessitate the development of alternative materials. Among the most promising candidates, zinc–tin oxide (ZTO) is an indium-free oxide semiconductor with considerable potential, but its relatively low carrier mobility and inherent limitations in thin-film quality demand further performance enhancements. This paper proposes a new approach to overcome these challenges by incorporating single-walled carbon nanotubes (SWNTs) as conductive fillers into the ZTO matrix and using a layer-by-layer multiple coating process to construct nanocomposite thin films. As a result, ZTO/SWNTs (0.07 wt.%) thin-film transistors (TFTs) fabricated with three coating cycles exhibited a high saturation mobility of 18.72 cm²/V·s, a threshold voltage of 0.84 V, and a subthreshold swing of 0.51 V/dec. These values represent an approximately four-fold improvement in mobility compared to ZTO TFT, showing that the multiple-coating-based nanocomposite strategy can effectively overcome the fundamental limitations. This study confirms the feasibility of achieving high-performance oxide semiconductor transistors without indium, providing a sustainable pathway for next-generation flexible electronics and display technologies. Full article

This paper focuses on the switching and modulation techniques of terahertz waves, develops ${\mathrm{VO}}_2$ thin-film materials with an SPP structure, and uses terahertz time-domain spectroscopy (THz-TDS) to study the semiconductor–metal phase transition characteristics of ${\mathrm{VO}}_2$ thin films, especially the photoinduced semiconductor–metal phase transition characteristics of silicon-based ${\mathrm{VO}}_2$ thin films. The optical modulation characteristics of silicon-based ${\mathrm{VO}}_2$ thin films to terahertz waves under different light excitation modes, such as continuous light irradiation at different wavelengths and femtosecond pulsed laser irradiation, were analyzed. Combining the optical modulation characteristics of silicon-based ${\mathrm{VO}}_2$ thin films with the filtering characteristics of SPP structures, composite structures of ${\mathrm{VO}}_2$ thin films with metal hole arrays, composite structures of ${\mathrm{VO}}_2$ thin films with metal block arrays, and silicon-based ${\mathrm{VO}}_2$ microstructure arrays were designed. The characteristics of this dual-function device were tested experimentally. The experiment proves that the ${\mathrm{VO}}_2$ film material with an SPP structure has a transmission rate dropping sharply from 32% to 1% under light excitation; the resistivity changes by more than six orders of magnitude, and the modulation effect is remarkable. By applying the SPP structure to the ${\mathrm{VO}}_2$ material, the material can simultaneously possess modulation and filtering functions, enhancing its optical performance in the terahertz band. Full article

Recently, with the development of automation technology in various fields, much research has been conducted on infrared photodetectors, which are the core technology of LiDAR sensors. However, most infrared photodetectors are expensive because they use compound semiconductors based on epitaxial processes, and they have low safety because they use the near-infrared (NIR) region that can damage the retina. Therefore, they are difficult to apply to automation technologies such as automobiles and factories where humans can be constantly exposed. In contrast, short-wavelength infrared photodetectors based on PbS QDs are actively being developed because they can absorb infrared rays in the eye-safe region by controlling the particle size of QDs and can be easily and inexpensively manufactured through a solution process. However, PbS QDs-based SWIR photodetectors have low chemical stability due to the electron/hole extraction layer processed by the solution process, making it difficult to manufacture them in the form of patterning and arrays. In this study, bulk NiO and ZnO were deposited by sputtering to achieve uniformity and patterning of thin films, and the performance of PbS QDs-based photodetectors was improved by optimizing the thickness and annealing conditions of the thin films. The fabricated photodetector achieved a high response characteristic of 114.3% through optimized band gap and improved transmittance characteristics. Full article

There is considerable interest in broadband nanomaterials, particularly transparent semiconductor oxides, within both fundamental research and technological applications. Historically, it has been considered that the variation in dopant concentration during the synthesis of semiconductor materials is a crucial factor in activating and/or modulating the optical and structural properties, particularly the bandgap and the parameters of the unit cell, of semiconductor oxides. Recently, tin oxide has emerged as a key material due to its excellent structural properties, optical transparency, and various promising applications in optoelectronics. This study utilized the ultrasonic spray pyrolysis technique to synthesize aluminum-doped tin oxide (ATO) thin films on quartz and polished single-crystal silicon substrates. The impact of varying aluminum doping levels (0, 2, 5, and 10 at. %) on morphology and structural and optical properties was examined. The ATO thin films were characterized using scanning electron microscopy (SEM), X-ray diffraction (XRD), and transmittance spectroscopy. SEM images demonstrated a slight reduction in the size of ATO nanoparticles as the aluminum doping concentration increased. XRD analysis revealed a tetragonal crystalline structure with the space group P42/mnm, and a shift in the XRD peaks to higher angles was noted with increasing aluminum content, indicating a decrease in the crystalline lattice parameters of ATO. The transmittance of the ATO films varied between 75% and 85%. By employing the transmittance spectra and the established Tauc formula the optical bandgap values of ATO films were calculated, showing an increase in the bandgap with higher doping levels. These findings were thoroughly analyzed and discussed; additionally, an effort was made to clarify the contradictory analyses present in the literature and to identify a doping range that avoids the onset of a secondary phase. Full article

The initial surface reaction of gallium nitride (GaN) grown by atomic layer deposition (GaN-ALD) was investigated using density functional theory (DFT) calculations. Trimethylgallium (TMG) and ammonia (NH₃) were used as gallium (Ga) and nitrogen (N) precursors, respectively. DFT calculations at the B3LYP/6-311+G(2d,p) and 6-31G(d) levels were performed to compute relative energies and optimize chemical structures, respectively. TMG adsorption on Si₁₅H₁₈–(NH₂)₂ and Si₁₅H₂₀=(NH)₂ clusters was modeled, where –NH₂ and =NH surface species served as adsorption sites. The reaction mechanisms in the adsorption and nitridation steps were investigated. The results showed that TMG can adsorb on both surface adsorption sites. In the initial adsorption stage, TMG adsorbs onto =NH- and –NH₂-terminated Si(100) surfaces with activation energies of 1.11 and 2.00 eV, respectively, indicating that the =NH site is more reactive. During subsequent NH3 adsorption, NH₃ adsorbs onto the residual TMG on the =NH- and –NH₂-terminated surfaces with activation energies of approximately 2.00 ± 0.02 eV. The reaction pathways indicate that NH₃ adsorbs via similar mechanisms on both surfaces, resulting in comparable nitridation kinetics. Furthermore, this study suggests that highly reactive NH₂⁻ species generated in the gas phase from ionized NH₃ may help reduce the process temperature in the GaN-ALD process. Full article

Gallium oxide (Ga₂O₃), as a wide-bandgap semiconductor material, is highly expected to find extensive applications in optoelectronic devices, high-power electronics, gas sensors, etc. However, the photoelectric properties of Ga₂O₃ still need to be improved before its devices become commercially viable. As is well known, doping is an effective method to modulate the various properties of semiconductor materials. In this study, Zn–N co-doped Ga₂O₃ films with various doping concentrations were grown in situ on sapphire substrates by atomic layer deposition (ALD) at 250 °C, followed by post-annealing at 900 °C. The post-annealed undoped Ga₂O₃ film showed a highly preferential orientation, whereas with the increase in Zn doping concentration, the preferential orientation of Ga₂O₃ films was deteriorated, turning it into an amorphous state. The surface roughness of the Ga₂O₃ thin films is largely affected by doping. As a result of post-annealing, the bandgaps of the Ga₂O₃ films can be modulated from 4.69 eV to 5.41 eV by controlling the Zn–N co-doping concentrations. When deposited under optimum conditions, high-quality Zn–N co-doped Ga₂O₃ films showed higher transmittance, a larger bandgap, and fewer defects compared with undoped ones. Full article

In this work, we present the development and validation of an automated system for the Successive Ionic Layer Adsorption and Reaction (SILAR) method, aimed at depositing Cu₂ZnSnS₄ (CZTS) thin films. The system is based on a Raspberry Pi Pico microcontroller programmed in Micro-Python (Thonny 4.0.2), allowing precise control over immersion sequences, timing intervals, and substrate positioning along two degrees of freedom. Automation enhances reproducibility, safety, and reduces human error compared with manual operation. CZTS films were deposited on borosilicate glass and optically and structurally characterized. A gradual darkening of the films with increasing deposition cycles indicates controlled material accumulation. X-ray diffraction (XRD) and Raman spectroscopy confirmed the presence of CZTS phases, although with a partially amorphous structure. The estimated optical bandgap of ~1.34 eV is consistent with photovoltaic applications. These results validate the functionality of the automated SILAR platform for repeatable and scalable thin-film fabrication, offering a low-cost alternative for producing semiconductor absorber layers in solar energy technologies. Full article

In the present work a-SiC:H thin films were prepared using magnetron sputtering technique for different substrate temperatures from 100 °C to 290 °C. Their optical properties were studied using the ellipsometry technique. The experimental results show that the optical band gap of the films varies from 2.00 eV to 2.18 eV for the hydrogenated films, whereas the Eg is equal to 1.29 eV when the film does not contain hydrogen atoms and for Ts = 100 °C. The refractive index has been observed to remain stable in the region of 100 °C–220 °C, whereas it drops significantly when the temperature of 290 °C is reached. Additionally, the refractive index exhibits an inverse relationship with Eg as a function of Ts. Notably, these thin films were deposited 12 years ago, and their optical properties have remained stable since then. Full article

The Al-Sb co-doped SnO₂ composite thin films were prepared by the sol–gel spin-coating method. The structure, morphology, optical and electrical properties of the samples were investigated using XRD, XPS, SEM, UV-Vis spectroscopy, and Hall effect tester, respectively. It was found that when the aluminum doping amount was 15 at%, the resistivity of the sample was the lowest, and the overall optoelectronic performance was the best. Moreover, the Al-SnO₂ composite thin film transformed from an n-type semiconductor to a p-type semiconductor. When Al and Sb were co-doped, the carrier concentration increased significantly from 4.234 × 10¹⁹ to 6.455 × 10²⁰. Finally, the conduction type of the Al-Sb-SnO₂ composite thin film changed from p-type to n-type. In terms of optical performance, the transmittance of the Al-Sb co-doped SnO₂ composite thin films in the visible light region was significantly improved, reaching up to 80% on average, which is favorable for applications in transparent optoelectronic devices. Additionally, the absorption edge of the thin films exhibited a blue-shift after co-doping, indicating an increase in the bandgap energy, which can be exploited to tune the light-absorption properties of the thin films for specific photonic applications. Full article

Thin-film assemblies containing an adhesion layer (AdL) or a release layer (RL) with nanoscale thickness are widely used in semiconductors, electrical circuit boards, optical and optoelectronic devices, photodiodes, and photonics applications. Current environmental concerns and technological demands necessitate continuous advancements in these nano-AdLs and nano-RLs in terms of formulation, design, functionality, and durability. Developing these nano-layers relies on understanding their structural properties, which is challenging because only characterization tools with nanoscale or sub-nanoscale lateral resolution can be employed. The aim of this review is to provide an overview of the current techniques and methods available for characterizing the structural properties of nano-layers in cross-section. Emphasis is placed on sample preparation methods, the fundamental principles, advantages, and limitations of various techniques, and examples from the existing literature. First, selecting the appropriate characterization technique depends on the required lateral resolution—it must be finer than the size of the structural feature of interest. A high lateral resolution relative to this structural feature translates to more accurate characterization, enabling effective profiling and mapping analysis. Subsequently, it is important to optimize sample preparation regarding shape, dimensions, and surface roughness, while minimizing artifacts. Combining techniques that offer complementary structural information—such as morphological, chemical, and nanomechanical data—is recommended to gain a comprehensive understanding of the nano-layer’s structure and properties. This is especially important when utilizing 3D characterization methods. It is worth noting that few examples of cross-sectional analysis for nano-AdLs and nano-RLs are available in the literature, highlighting the need for further nanoscale investigations. This review aims to serve as a practical guide for scientists, helping them identify suitable characterization procedures based on the specific structural information they seek to obtain. Full article

TiO₂ is an abundant material on Earth, essential for the sustainable and cost-effective development of various technologies, with anatase being the most effective polymorph for photocatalytic and photovoltaic applications. Bulk crystalline anatase TiO₂ exhibits a band gap energy E_gA = 3.2 eV, for tetragonal lattice parameters a_A = 0.3785 nm and c_A = 0.9514 nm, but these characteristics vary for amorphous or polycrystalline thin films. Reactive magnetron sputtering has proven suitable for the preparation of TiO₂ coatings on glass fiber substrates, with structural and optical characteristics that change during growth. Below a minimum thickness (t < 0.2 μm), the films have an amorphous nature or extremely small crystallite sizes not observable by X-ray diffraction. Afterwards, compressed quasi-randomly orientated crystallites are detected (volume strain ΔV = −0.02 and stress σ_V = −3.5 GPa for t = 0.2 μm) that evolve into relaxed and preferentially (004) orientated crystallites, reaching the standard anatase values at t ~ 1.4 μm with σ_V = 0.0 GPa. The band gap energy increases with lattice distortion according to the relation ∆E_g (eV) = −6∆V, and a further increase is observed for the thinnest coatings (∆E_g = 0.24 eV for t = 0.05 μm). Full article

Artificial retinal devices require a high-density electrode array and mechanical flexibility to effectively stimulate retinal cells. However, designing such devices presents significant challenges, including the need to conform to the curvature of the eyeball and cover a large area using a single platform. To address these issues, we developed a parylene-based multi-module retinal device (MMRD) integrating a complementary metal-oxide semiconductor (CMOS) system. The proposed device is designed for suprachoroidal transretinal stimulation, with each module comprising a parylene-C thin-film substrate, a CMOS chip, and a ceramic substrate housing seven platinum electrodes. The smart CMOS system significantly reduces wiring complexity, enhancing the device’s practicality. To improve fabrication reliability, we optimized the encapsulation process, introduced multiple silane coupling modifications, and utilized polyvinyl alcohol (PVA) for easier detachment in flip-chip bonding. This study demonstrates the fabrication and evaluation of the MMRD through in vitro and in vivo experiments. The device successfully generated the expected current stimulation waveforms in both settings, highlighting its potential as a promising candidate for future artificial vision applications. Full article

In plasma-enhanced chemical vapor deposition (PECVD) processes, thin films can accumulate on the inner chamber walls, resulting in particle contamination and process drift. In this study, we investigate the physical and chemical properties of these wall-deposited films to understand their spatial variation and impact on chamber maintenance. A 6-inch capacitively coupled plasma (CCP)-type PECVD system was used to deposit SiO₂ films, whilst long silicon coupons were attached vertically to the chamber side walls to collect contamination samples. The collected contamination samples were comparatively analyzed in terms of their chemical properties and surface morphology. The results reveal significant differences in hydrogen content and Si–O bonding configurations compared to reference films deposited on wafers. The top chamber wall, located near the plasma region, exhibited higher hydrogen incorporation and larger Si–O–Si bonding angles, while the bottom wall exhibited rougher surfaces with larger particulate agglomerates. These variations were closely linked to differences in gas flow dynamics, precursor distribution, and the energy state of the plasma species at different chamber heights. The findings indicate that top-wall contaminants are more readily cleaned due to their high hydrogen content, while bottom-wall residues may be more persistent and pose higher risks for particle generation. This study provides insights into wall contamination behavior in PECVD systems and suggests strategies for spatially optimized chamber cleaning and conditioning in high-throughput semiconductor processes. Full article