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Physics-Based Simulation of Master Template Fabrication: Integrated Modeling of Resist Coating, Electron Beam Lithography, and Reactive Ion Etching

Jean Chien,
Lily Chuang and
Eric Lee

Electronics2025, 14(23), 4751;https://doi.org/10.3390/electronics14234751

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2 December 2025

Nanoimprint lithography (NIL) master fidelity is governed by coupled variations beginning with resist spin-coating, proceeding through electron beam exposure, and culminating in anisotropic etch transfer. We present an integrated, physics-based simul...

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