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Keywords = focused ion-beam technology

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18 pages, 26273 KiB  
Review
Recent Applications of Focused Ion Beam–Scanning Electron Microscopy in Advanced Packaging
by Huan Zhang, Mengmeng Ma, Yuhang Liu, Wenwu Zhang and Chonglei Zhang
J. Manuf. Mater. Process. 2025, 9(5), 158; https://doi.org/10.3390/jmmp9050158 - 13 May 2025
Viewed by 1600
Abstract
Advanced packaging represents a crucial technological evolution aimed at overcoming limitations posed by Moore’s Law, driving the semiconductor industry from two-dimensional toward three-dimensional integrated structures. The increasing complexity and miniaturization of electronic devices have significantly heightened the challenges associated with failure analysis during [...] Read more.
Advanced packaging represents a crucial technological evolution aimed at overcoming limitations posed by Moore’s Law, driving the semiconductor industry from two-dimensional toward three-dimensional integrated structures. The increasing complexity and miniaturization of electronic devices have significantly heightened the challenges associated with failure analysis during process development. The focused ion beam–scanning electron microscope (FIB-SEM), characterized by its high processing precision and exceptional imaging resolution, has emerged as a powerful solution for the fabrication, defect localization, and failure analysis of micro- and nano-scale devices. This paper systematically reviews the innovative applications of FIB-SEM in the research of core issues, such as through-silicon-via (TSV) defects, bond interfacial failures, and redistribution layer (RDL) electromigration. Additionally, the paper discusses multimodal integration strategies combining FIB-SEM with advanced analytical techniques, such as high-resolution three-dimensional X-ray microscopy (XRM), electron backscatter diffraction (EBSD), and spectroscopy. Finally, it provides a perspective on the emerging applications and potential of frontier technologies, such as femtosecond-laser-assisted FIB, in the field of advanced packaging analysis. Full article
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10 pages, 2777 KiB  
Article
An In-Plane Single-Photon Emitter Combining a Triangular Split-Ring Micro-Optical Resonator and a Colloidal Quantum Dot
by Kohki Mukai, Kyosuke Uchiyama, Kohei Iwata and Issei Pribyl
Nanomaterials 2025, 15(5), 335; https://doi.org/10.3390/nano15050335 - 21 Feb 2025
Viewed by 560
Abstract
We propose a simple and innovative configuration consisting of a quantum dot and micro-optical resonator that emits single photons with good directionality in a plane parallel to the substrate. In this device, a single quantum dot is placed as a light source between [...] Read more.
We propose a simple and innovative configuration consisting of a quantum dot and micro-optical resonator that emits single photons with good directionality in a plane parallel to the substrate. In this device, a single quantum dot is placed as a light source between the slits of a triangular split-ring micro-optical resonator (SRR) supported in an optical polymer film with an air-bridge structure. Although most of the previous single photon emitters in solid-state devices emitted photons upward from the substrate, operation simulations confirmed that this configuration realizes lateral light emission in narrow regions above, below, left, and right in the optical polymer film, despite the absence of a light confinement structure such as an optical waveguide. This device can be fabricated using silica-coated colloidal quantum dots, focused ion beam (FIB) lithography, and wet etching using an oxide layer on a silicon substrate as a sacrificial layer. The device has a large tolerance to the variation in the position of the SRR in the optical polymer film and the height of the air-bridge. We confirmed that Pt-SRRs can be formed on the optical polymer film using FIB lithography. This simple lateral photon emitter is suitable for coupling with optical fibers and for fabricating planar optical quantum solid-state circuits, and is useful for the development of quantum information processing technology. Full article
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13 pages, 1089 KiB  
Review
Advances in Targeted Microbeam Irradiation Methods for Live Caenorhabditis elegans
by Michiyo Suzuki
Biology 2024, 13(11), 864; https://doi.org/10.3390/biology13110864 - 24 Oct 2024
Viewed by 1790
Abstract
Charged-particle microbeam irradiation devices, which can convert heavy-ion or proton beams into microbeams and irradiate individual animal cells and tissues, have been developed and used for bioirradiation in Japan, the United States, China, and France. Microbeam irradiation technology has been used to analyze [...] Read more.
Charged-particle microbeam irradiation devices, which can convert heavy-ion or proton beams into microbeams and irradiate individual animal cells and tissues, have been developed and used for bioirradiation in Japan, the United States, China, and France. Microbeam irradiation technology has been used to analyze the effects of irradiation on mammalian cancer cells, especially bystander effects. In 2006, individual-level microbeam irradiation of the nematode Caenorhabditis elegans was first realized using JAEA-Takasaki’s (now QST-TIAQS’s) TIARA collimated microbeam irradiation device. As of 2023, microbeam irradiation of C. elegans has been achieved at five sites worldwide (one in Japan, one in the United States, one in China, and two in France). This paper summarizes the global progress in the field of microbeam biology using C. elegans, while focusing on issues unique to microbeam irradiation of live C. elegans, such as the method of immobilizing C. elegans for microbeam experiments. Full article
(This article belongs to the Special Issue Microbeam Radiation Biology and Its State-of-the-Art Technology)
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29 pages, 4587 KiB  
Review
A Thorough Review of Emerging Technologies in Micro- and Nanochannel Fabrication: Limitations, Applications, and Comparison
by Koosha Karimi, Ali Fardoost, Nikhil Mhatre, Jay Rajan, David Boisvert and Mehdi Javanmard
Micromachines 2024, 15(10), 1274; https://doi.org/10.3390/mi15101274 - 21 Oct 2024
Cited by 13 | Viewed by 6123
Abstract
In recent years, the field of micro- and nanochannel fabrication has seen significant advancements driven by the need for precision in biomedical, environmental, and industrial applications. This review provides a comprehensive analysis of emerging fabrication technologies, including photolithography, soft lithography, 3D printing, electron-beam [...] Read more.
In recent years, the field of micro- and nanochannel fabrication has seen significant advancements driven by the need for precision in biomedical, environmental, and industrial applications. This review provides a comprehensive analysis of emerging fabrication technologies, including photolithography, soft lithography, 3D printing, electron-beam lithography (EBL), wet/dry etching, injection molding, focused ion beam (FIB) milling, laser micromachining, and micro-milling. Each of these methods offers unique advantages in terms of scalability, precision, and cost-effectiveness, enabling the creation of highly customized micro- and nanochannel structures. Challenges related to scalability, resolution, and the high cost of traditional techniques are addressed through innovations such as deep reactive ion etching (DRIE) and multipass micro-milling. This paper also explores the application potential of these technologies in areas such as lab-on-a-chip devices, biomedical diagnostics, and energy-efficient cooling systems. With continued research and technological refinement, these methods are poised to significantly impact the future of microfluidic and nanofluidic systems. Full article
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14 pages, 4488 KiB  
Article
Analysis of the Problems of the Research and Modernization of Emission Units of Analytical Devices of Vacuum Electronics
by Alpamys T. Ibrayev and Aigerim B. Sagyndyk
Appl. Sci. 2024, 14(19), 9077; https://doi.org/10.3390/app14199077 - 8 Oct 2024
Viewed by 816
Abstract
In various electron-optical and ion-beam devices and vacuum electronics installations, emission elements and units are used to extract and form beams of charged particles. Their focusing properties significantly affect the quality parameters and technical characteristics of the analytical devices and technological installations in [...] Read more.
In various electron-optical and ion-beam devices and vacuum electronics installations, emission elements and units are used to extract and form beams of charged particles. Their focusing properties significantly affect the quality parameters and technical characteristics of the analytical devices and technological installations in which they are used. Due to the specificity of the initial conditions during the formation of the beams of charged particles in the area of charged particle extraction, the methods of studying single and conventional immersion electron lenses are not suitable for the high quality theoretical and numerical studies of the properties of immersion objectives. In this paper, theoretical and numerical studies were conducted on the problems in analyzing the focusing parameters of charged particles in emission elements and units when solving problems of designing and upgrading devices and installations of vacuum electronics. As a result of the studies, a theoretical method for studying cathode lenses with a curved optical axis was developed and options for solving problems in correcting aberrations of emission elements and units were proposed. Full article
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25 pages, 12866 KiB  
Review
Advances in and Future Perspectives on High-Power Ceramic Lasers
by Vinay Rastogi and Shivanand Chaurasia
Photonics 2024, 11(10), 942; https://doi.org/10.3390/photonics11100942 - 7 Oct 2024
Cited by 1 | Viewed by 2117
Abstract
Advancements in laser glass compositions and manufacturing techniques has allowed the development of a new category of high-energy and high-power laser systems which are being used in various applications, such as for fundamental research, material processing and inertial confinement fusion (ICF) technologies research. [...] Read more.
Advancements in laser glass compositions and manufacturing techniques has allowed the development of a new category of high-energy and high-power laser systems which are being used in various applications, such as for fundamental research, material processing and inertial confinement fusion (ICF) technologies research. A ceramic laser is a remarkable revolution in solid state lasers. It exhibits crystalline properties, high yields, better thermal conductivity, a uniformly broadened emission cross-section, and a higher mechanical constant. Polycrystalline ceramic lasers combine the properties of glasses and crystals, which offer the unique advantages of high thermal stability, excellent optical transparency, and the ability to incorporate active laser ions homogeneously. They are less expensive and have a similar fabrication process to glass lasers. Recent developments in these classes of lasers have led to improvements in their efficiency, beam quality, and wavelength versatility, making them suitable for a broad range of applications, such as scientific research requiring ultra-fast laser pulses, medical procedures like laser surgery and high-precision cutting and welding in industrial manufacturing. The future of ceramic lasers looks promising, with ongoing research focused on enhancing their performance, developing new doping materials and expanding their functional wavelengths. The ongoing progress in high-power ceramic lasers is continuously expanding the limits of laser technology, therefore allowing the development of more powerful and efficient systems for a wide range of advanced and complex applications. In this paper, we review the advances, limitations and future perspectives of ceramic lasers. Full article
(This article belongs to the Special Issue Recent Advances and Future Perspectives in Solid-State Lasers)
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22 pages, 10262 KiB  
Article
Controllable Fabrication of Gallium Ion Beam on Quartz Nanogrooves
by Peizhen Mo, Jinyan Cheng, Qiuchen Xu, Hongru Liu, Chengyong Wang, Suyang Li and Zhishan Yuan
Micromachines 2024, 15(9), 1105; https://doi.org/10.3390/mi15091105 - 30 Aug 2024
Viewed by 1440
Abstract
Nanogrooves with high aspect ratios possess small size effects and high-precision optical control capabilities, as well as high specific surface area and catalytic performance, demonstrating significant application value in the fields of optics, semiconductor processes, and biosensing. However, existing manufacturing methods face issues [...] Read more.
Nanogrooves with high aspect ratios possess small size effects and high-precision optical control capabilities, as well as high specific surface area and catalytic performance, demonstrating significant application value in the fields of optics, semiconductor processes, and biosensing. However, existing manufacturing methods face issues such as complexity, high costs, low efficiency, and low precision, especially in the difficulty of fabricating nanogrooves with high resolution on the nanoscale. This study proposes a method based on focused ion beam technology and a layer-by-layer etching process, successfully preparing V-shaped and rectangular nanogrooves on a silicon dioxide substrate. Combining with cellular automaton algorithm, the ion sputtering flux and redeposition model was simulated. By converting three-dimensional grooves to discrete rectangular slices through a continuous etching process and utilizing the sputtering and redeposition effects of gallium ion beams, high-aspect-ratio V-shaped grooves with up to 9.6:1 and rectangular grooves with nearly vertical sidewalls were achieved. In addition, the morphology and composition of the V-shaped groove sidewall were analyzed in detail using transmission electron microscopy (TEM) and tomography techniques. The influence of the etching process parameters (ion current, dwell time, scan times, and pixel overlap ratio) on groove size was analyzed, and the optimized process parameters were obtained. Full article
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15 pages, 5323 KiB  
Article
A Platform for Ultra-Fast Proton Probing of Matter in Extreme Conditions
by Luca Volpe, Teresa Cebriano Ramírez, Carlos Sánchez Sánchez, Alberto Perez, Alessandro Curcio, Diego De Luis, Giancarlo Gatti, Berkhahoum Kebladj, Samia Khetari, Sophia Malko, Jose Antonio Perez-Hernandez and Maria Dolores Rodriguez Frias
Sensors 2024, 24(16), 5254; https://doi.org/10.3390/s24165254 - 14 Aug 2024
Viewed by 1144
Abstract
Recent developments in ultrashort and intense laser systems have enabled the generation of short and brilliant proton sources, which are valuable for studying plasmas under extreme conditions in high-energy-density physics. However, developing sensors for the energy selection, focusing, transport, and detection of these [...] Read more.
Recent developments in ultrashort and intense laser systems have enabled the generation of short and brilliant proton sources, which are valuable for studying plasmas under extreme conditions in high-energy-density physics. However, developing sensors for the energy selection, focusing, transport, and detection of these sources remains challenging. This work presents a novel and simple design for an isochronous magnetic selector capable of angular and energy selection of proton sources, significantly reducing temporal spread compared to the current state of the art. The isochronous selector separates the beam based on ion energy, making it a potential component in new energy spectrum sensors for ions. Analytical estimations and Monte Carlo simulations validate the proposed configuration. Due to its low temporal spread, this selector is also useful for studying extreme states of matter, such as proton stopping power in warm dense matter, where short plasma stagnation time (<100 ps) is a critical factor. The proposed selector can also be employed at higher proton energies, achieving final time spreads of a few picoseconds. This has important implications for sensing technologies in the study of coherent energy deposition in biology and medical physics. Full article
(This article belongs to the Section Physical Sensors)
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15 pages, 6691 KiB  
Article
Atomic Depth Image Transfer of Large-Area Optical Quartz Materials Based on Pulsed Ion Beam
by Shuyang Ran, Kefan Wen, Lingbo Xie, Xingyu Zhou, Ye Tian, Shuo Qiao, Feng Shi and Xing Peng
Micromachines 2024, 15(7), 914; https://doi.org/10.3390/mi15070914 - 15 Jul 2024
Viewed by 1401
Abstract
The high-efficiency preparation of large-area microstructures of optical materials and precision graphic etching technology is one of the most important application directions in the atomic and near-atomic-scale manufacturing industry. Traditional focused ion beam (FIB) and reactive ion etching (RIE) methods have limitations in [...] Read more.
The high-efficiency preparation of large-area microstructures of optical materials and precision graphic etching technology is one of the most important application directions in the atomic and near-atomic-scale manufacturing industry. Traditional focused ion beam (FIB) and reactive ion etching (RIE) methods have limitations in precision and efficiency, hindering their application in automated mass production. The pulsed ion beam (PIB) method addresses these issues by enhancing ion beam deflection to achieve high-resolution material removal on a macro scale, which can reach the equivalent removal resolution of 6.4 × 10−4 nm. Experiments were conducted on a quartz sample (10 × 10 × 1 mm) with a specific pattern mask using the custom PIB processing device. The surface morphology, etching depth, and roughness were measured post-process. The results demonstrated that precise control over cumulative sputtering time yielded well-defined patterns with expected average etching depths and surface roughness. This confirms the PIB technique’s potential for precise atomic depth image transfer and its suitability for industrial automation, offering a significant advancement in microfabrication technology. Full article
(This article belongs to the Special Issue Precision Optical Manufacturing and Processing)
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11 pages, 11337 KiB  
Article
The Effects of Induction Plasma Spheroidization on the Properties of Yttrium-Stabilized Zirconia Powders and the Performance of Corresponding Thermal Barrier Coatings for Gas Turbine Engine Applications
by Haoran Peng, Yueguang Yu, Jianxin Dong, Tianjie Shi, Kang Yuan, Zheng Yan and Botian Bai
Coatings 2024, 14(5), 627; https://doi.org/10.3390/coatings14050627 - 16 May 2024
Cited by 3 | Viewed by 1522
Abstract
To modify the structure of thermal barrier coatings and improve their high-temperature resistance, induction plasma spheroidization (IPS) technology was applied to regulate the structure of YSZ powders in this study. The surface morphology, particle size distribution, phase composition, and internal microstructure of the [...] Read more.
To modify the structure of thermal barrier coatings and improve their high-temperature resistance, induction plasma spheroidization (IPS) technology was applied to regulate the structure of YSZ powders in this study. The surface morphology, particle size distribution, phase composition, and internal microstructure of the conventional agglomerated and spheroidized powders were characterized using scanning electron microscopy and focused ion beam analysis methods. The results showed that the microstructure of the powders presented uneven evolution in the induction plasma stream. Due to the existence of the temperature gradient along the radial direction of the powders, the IPS powders consisted of outer dense shells and internal porous cores. The mechanical property of such shell–core structure was analyzed by using the finite elemental simulation method. In addition, coatings were prepared using the IPS powders and the agglomerated powders. The IPS coating showed improved water-cooling thermal cycling resistance compared to the conventional coating. Full article
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16 pages, 15241 KiB  
Article
Corrosion Behavior of Nickel–Titanium Continuous-Casted Alloys
by Minja Miličić Lazić, Dijana Mitić, Katarina Radović, Igor Đorđević, Peter Majerič, Rebeka Rudolf and Branimir N. Grgur
Metals 2024, 14(1), 88; https://doi.org/10.3390/met14010088 - 11 Jan 2024
Cited by 5 | Viewed by 2899
Abstract
Variations in the corrosion behavior of biomedical NiTi alloys in Cl containing and acidic environments present a problem with their biological implantation. The objective of this research was to evaluate the synergy of the microstructure, the corrosion behavior, and the biocompatibility of [...] Read more.
Variations in the corrosion behavior of biomedical NiTi alloys in Cl containing and acidic environments present a problem with their biological implantation. The objective of this research was to evaluate the synergy of the microstructure, the corrosion behavior, and the biocompatibility of novel continuous-cast NiTi alloys and to compare them with commercial NiTi alloys. The two alloys have a practically identical nominal chemical composition, but they differ in production technology. The continuous casting technology involved vacuum induction melting of the basic components and vertical continuous casting, while the commercial NiTi alloy was produced through a process of casting, hot rolling, and forming into square shapes. The microstructure was revealed to determine the surface area and size of grains. The corrosion of a commercial nickel–titanium alloy and one prepared by a novel continuous casting method in acidic and chloride-containing solutions was studied via analytical and electrochemical tests. Localized corrosion characteristics related to oxide properties, when exposed to 9 g L−1 NaCl solution, were examined with focused ion beam analysis and subsequent microchemical analysis of the formed corrosive products. Corrosion potential over time and the oxide film resistance were analyzed using linear polarization measurements. To obtain a preliminary estimate of biocompatibility, human fibroblast cells were used in indirect contact, i.e., alloy conditioning medium. The continuous casting method resulted in a reduction in the average grain size in comparison to the commercial sample and better corrosion stability of the sample in an acidic environment. Also, in a solution of 9 g L−1 NaCl the commercial sample showed high values for the corrosion current density (jcorr = 6 μA cm−2), which indicated low corrosion resistance, while the continuous casting sample possessed much better corrosion stability and lower values for the corrosion current density (jcorr = 0.2 μA cm−2). In line with that, elemental analysis of the corroded surfaces showed higher Cl ion deposition over the surface layer of the commercial sample, suggesting local oxide breakdown. Moreover, NiTicc reached a value three times higher for polarization resistance (Rp = 270 kΩ cm2) over time in comparison to the commercial sample (Rp~100 kΩ cm2). Biocompatibility evaluation showed that human fibroblast cells exhibited altered metabolic activity. An MTT assay showed that cells’ mitochondrial activity dropped below that of control cells in the presence of both materials’ supernatants. Full article
(This article belongs to the Section Corrosion and Protection)
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15 pages, 9583 KiB  
Technical Note
A Method to Locally Irradiate Specific Organ in Model Organisms Using a Focused Heavy-Ion Microbeam
by Tomoo Funayama, Michiyo Suzuki, Nobumasa Miyawaki and Hirotsugu Kashiwagi
Biology 2023, 12(12), 1524; https://doi.org/10.3390/biology12121524 - 14 Dec 2023
Cited by 2 | Viewed by 2319
Abstract
The functions of organisms are performed by various tissues composed of different cell types. Localized irradiation with heavy-ion microbeams, which inactivate only a portion of the constituent cells without destroying the physical intercellular connections of the tissue, is a practical approach for elucidating [...] Read more.
The functions of organisms are performed by various tissues composed of different cell types. Localized irradiation with heavy-ion microbeams, which inactivate only a portion of the constituent cells without destroying the physical intercellular connections of the tissue, is a practical approach for elucidating tissue functions. However, conventional collimated microbeams are limited in the shape of the area that can be irradiated. Therefore, using a focused heavy-ion microbeam that generates a highly precise beam spot, we developed a technology to uniformly irradiate specific tissues of an organism with a defined dose, which conventional methods cannot achieve. The performance of the developed paint irradiation technology was evaluated. By irradiating the CR-39 ion track detector, we confirmed that the new method, in which each ion hit position is placed uniformly in the irradiated area, makes it possible to uniformly paint the area at a specified dose. The targeted irradiation of the pharynx and gonads of living Caenorhabditis elegans demonstrated that the irradiated ions were distributed in the same shape as the targeted tissue observed under a microscope. This technology will elucidate biological mechanisms that are difficult to analyze with conventional collimated microbeam irradiation. Full article
(This article belongs to the Special Issue Microbeam Radiation Biology and Its State-of-the-Art Technology)
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15 pages, 4396 KiB  
Article
Nano Hotplate Fabrication for Metal Oxide-Based Gas Sensors by Combining Electron Beam and Focused Ion Beam Lithography
by Zhifu Feng, Damiano Giubertoni, Alessandro Cian, Matteo Valt, Mario Barozzi, Andrea Gaiardo and Vincenzo Guidi
Micromachines 2023, 14(11), 2060; https://doi.org/10.3390/mi14112060 - 4 Nov 2023
Viewed by 1771
Abstract
Metal oxide semiconductor (MOS) gas sensors are widely used for gas detection. Typically, the hotplate element is the key component in MOS gas sensors which provide a proper and tunable operation temperature. However, the low power efficiency of the standard hotplates greatly limits [...] Read more.
Metal oxide semiconductor (MOS) gas sensors are widely used for gas detection. Typically, the hotplate element is the key component in MOS gas sensors which provide a proper and tunable operation temperature. However, the low power efficiency of the standard hotplates greatly limits the portable application of MOS gas sensors. The miniaturization of the hotplate geometry is one of the most effective methods used to reduce its power consumption. In this work, a new method is presented, combining electron beam lithography (EBL) and focused ion beam (FIB) technologies to obtain low power consumption. EBL is used to define the low-resolution section of the electrode, and FIB technology is utilized to pattern the high-resolution part. Different Au++ ion fluences in FIBs are tested in different milling strategies. The resulting devices are characterized by scanning electron microscopy (SEM), atomic force microscopy (AFM), and secondary ion mass spectrometry (SIMS). Furthermore, the electrical resistance of the hotplate is measured at different voltages, and the operational temperature is calculated based on the Pt temperature coefficient of resistance value. In addition, the thermal heater and electrical stability is studied at different temperatures for 110 h. Finally, the implementation of the fabricated hotplate in ZnO gas sensors is investigated using ethanol at 250 °C. Full article
(This article belongs to the Special Issue MEMS in Italy 2023)
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10 pages, 2718 KiB  
Article
Measurement and Simulation of Ultra-Low-Energy Ion–Solid Interaction Dynamics
by Michael Titze, Jonathan D. Poplawsky, Silvan Kretschmer, Arkady V. Krasheninnikov, Barney L. Doyle, Edward S. Bielejec, Gerhard Hobler and Alex Belianinov
Micromachines 2023, 14(10), 1884; https://doi.org/10.3390/mi14101884 - 30 Sep 2023
Cited by 1 | Viewed by 2295
Abstract
Ion implantation is a key capability for the semiconductor industry. As devices shrink, novel materials enter the manufacturing line, and quantum technologies transition to being more mainstream. Traditional implantation methods fall short in terms of energy, ion species, and positional precision. Here, we [...] Read more.
Ion implantation is a key capability for the semiconductor industry. As devices shrink, novel materials enter the manufacturing line, and quantum technologies transition to being more mainstream. Traditional implantation methods fall short in terms of energy, ion species, and positional precision. Here, we demonstrate 1 keV focused ion beam Au implantation into Si and validate the results via atom probe tomography. We show the Au implant depth at 1 keV is 0.8 nm and that identical results for low-energy ion implants can be achieved by either lowering the column voltage or decelerating ions using bias while maintaining a sub-micron beam focus. We compare our experimental results to static calculations using SRIM and dynamic calculations using binary collision approximation codes TRIDYN and IMSIL. A large discrepancy between the static and dynamic simulation is found, which is due to lattice enrichment with high-stopping-power Au and surface sputtering. Additionally, we demonstrate how model details are particularly important to the simulation of these low-energy heavy-ion implantations. Finally, we discuss how our results pave a way towards much lower implantation energies while maintaining high spatial resolution. Full article
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23 pages, 6899 KiB  
Review
The 3D Controllable Fabrication of Nanomaterials with FIB-SEM Synchronization Technology
by Lirong Zhao, Yimin Cui, Junyi Li, Yuxi Xie, Wenping Li and Junying Zhang
Nanomaterials 2023, 13(12), 1839; https://doi.org/10.3390/nano13121839 - 11 Jun 2023
Cited by 5 | Viewed by 4724
Abstract
Nanomaterials with unique structures and functions have been widely used in the fields of microelectronics, biology, medicine, and aerospace, etc. With advantages of high resolution and multi functions (e.g., milling, deposition, and implantation), focused ion beam (FIB) technology has been widely developed due [...] Read more.
Nanomaterials with unique structures and functions have been widely used in the fields of microelectronics, biology, medicine, and aerospace, etc. With advantages of high resolution and multi functions (e.g., milling, deposition, and implantation), focused ion beam (FIB) technology has been widely developed due to urgent demands for the 3D fabrication of nanomaterials in recent years. In this paper, FIB technology is illustrated in detail, including ion optical systems, operating modes, and combining equipment with other systems. Together with the in situ and real-time monitoring of scanning electron microscopy (SEM) imaging, a FIB-SEM synchronization system achieved 3D controllable fabrication from conductive to semiconductive and insulative nanomaterials. The controllable FIB-SEM processing of conductive nanomaterials with a high precision is studied, especially for the FIB-induced deposition (FIBID) 3D nano-patterning and nano-origami. As for semiconductive nanomaterials, the realization of high resolution and controllability is focused on nano-origami and 3D milling with a high aspect ratio. The parameters of FIB-SEM and its working modes are analyzed and optimized to achieve the high aspect ratio fabrication and 3D reconstruction of insulative nanomaterials. Furthermore, the current challenges and future outlooks are prospected for the 3D controllable processing of flexible insulative materials with high resolution. Full article
(This article belongs to the Section Nanofabrication and Nanomanufacturing)
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