Search Results (30)

Ultraviolet light-emitting diodes (LEDs) based on Aluminum Gallium Nitride (AlGaN) suffer from poor carriers’ confinement effect, one possible solution to this problem is to increase the barrier heights for carriers by increasing Aluminum content in quantum barriers (QBs), which results in a higher turn-on voltage. Keeping this in mind, we have improved the carriers’ confinement by introducing a small amount of Boron nitride (BN) (2%) in ternary QBs and an electron injecting layer, which results in higher barriers that restrict the out-of-active region movement of electrons and holes. With quaternary B_xAl_yGa_zN QBs, significantly enhanced electrons and hole concentrations can be observed in the active region of quantum wells (QWs), which leads to a 4.3 times increased radiative recombination rate with a 68% better internal quantum efficiency (IQE) than the referenced conventional LEDs. Relying on the fairly improved IQE and radiative recombinations, other optoelectronic characteristics such as luminous power, emission intensity, etc., are also enhanced. Our whole analysis is based on numerical techniques but we believe that fabricating the proposed type of LEDs will result in desirable light extraction and external quantum efficiencies. Full article

In this study, we aim to enhance the internal quantum efficiency (IQE) of AlGaN-based ultraviolet (UV) light-emitting diodes (LEDs) by using the short-period AlGaN/GaN superlattice as a tunnel junction (TJ) to construct polarized structures. We analyze in detail the effect of this polarized TJ on the carrier injection efficiency and investigate the increase in hole and electron density caused by the formation of 2D hole gas (2DHG) and 2D electron gas (2DEG) in the superlattice structure. In addition, a dielectric layer is introduced to evaluate the effect of stress changes on the tunneling probability and current spread in TJ. At a current of 140 mA, this method demonstrates effective current expansion. Our results not only improve the performance of UV LEDs but also provide an important theoretical and experimental basis for future research on UV LEDs based on superlattice TJ. In addition, our study also highlights the key role of group III nitride materials in achieving efficient UV luminescence, and the polarization characteristics and band structure of these materials are critical for optimizing carrier injection and recombination processes. Full article

Serious electron leakage and poor hole injection efficiency are still challenges for deep ultraviolet AlGaN-based light-emitting diodes with a traditional structure in achieving high performance. Currently, the majority of research works concentrate on optimizing the structures of the electron blocking layer (EBL) and last quantum barrier (LQB) separately, rather than considering them as an integrated structure. Therefore, in this study, an Al-content-varied AlGaN composite last quantum barrier (CLQB) layer is proposed to replace the traditional EBL and LQB layers. It is found that when the Al content in the CLQB decreases from 70% to 60% along the growth direction, the sample’s luminescence efficiency is improved, which can be ascribed to the higher carrier concentration in the multiple quantum well active region caused by suppressed electron leakage and enhanced hole injection. Additionally, in the CLQB structure, the carrier loss at the EBL/LQB hetero-interface, which is inevitable in the traditional structure, can be avoided. However, if the Al content in the CLQB changes in an opposite way, i.e., increasing from 60% to 70%, the device optoelectronic performance deteriorates, since the electron leakage is enhanced and the hole injection is suppressed. Full article

In this study, we propose a polarized electron blocking layer (EBL) structure using Al_xGa_1−xN/Al_xGa_1−xN to enhance the internal quantum efficiency (IQE) of AlGaN-based ultraviolet light-emitting diodes (UV LEDs). Our findings indicate that this polarized EBL structure significantly improves IQE compared to conventional EBLs. Additionally, we introduce an electric-field reservoir (EFR) optimization method to maximize IQE. Specifically, optimizing the polarized EBL structure of Al_xGa_1−xN/Al_xGa_1−xN enhances the hole drift rate, resulting in an IQE improvement of 19% and an optical output power increase of 186 mW at a current of 210 mA. Full article

This research study thoroughly examines the optimal thickness of indium tin oxide (ITO), a transparent electrode, for near-ultraviolet (NUV) light-emitting diodes (LEDs) based on InGaN/AlGaInN materials. A range of ITO thicknesses from 30 to 170 nm is investigated, and annealing processes are performed to determine the most favorable figure of merit (FOM) by balancing transmittance and sheet resistance in the NUV region. Among the films of different thicknesses, an ITO film measuring 110 nm, annealed at 550 °C for 1 min, demonstrates the highest FOM. This film exhibits notable characteristics, including 89.0% transmittance at 385 nm, a sheet resistance of 131 Ω/□, and a contact resistance of 3.1 × 10⁻³ Ω·cm². Comparing the performance of NUV LEDs using ITO films of various thicknesses (30, 50, 70, 90, 130, 150, and 170 nm), it is observed that the NUV LED employing ITO with a thickness of 110 nm achieves a maximum 48% increase in light output power at 50 mA while maintaining the same forward voltage at 20 mA. Full article

AlGaN-based deep ultraviolet light-emitting diodes (DUV LEDs) have great application prospects in sterilization, UV phototherapy, biological monitoring and other aspects. Due to their advantages of energy conservation, environmental protection and easy miniaturization realization, they have garnered much interest and been widely researched. However, compared with InGaN-based blue LEDs, the efficiency of AlGaN-based DUV LEDs is still very low. This paper first introduces the research background of DUV LEDs. Then, various methods to improve the efficiency of DUV LED devices are summarized from three aspects: internal quantum efficiency (IQE), light extraction efficiency (LEE) and wall-plug efficiency (WPE). Finally, the future development of efficient AlGaN-based DUV LEDs is proposed. Full article

Conventional deep-ultraviolet (UV) light-emitting diodes (LEDs) based on AlGaN crystals have extremely low light-emission efficiencies due to the absorption in p-type GaN anode contacts. UV-light-transparent anode structures are considered as one of the solutions to increase a light output power. To this end, the present study focuses on developing a transparent AlGaN homoepitaxial tunnel junction (TJ) as the anode of a deep-UV LED. Deep-UV LEDs composed of n⁺/p⁺-type AlGaN TJs were fabricated under the growth condition that reduced the carrier compensation in the n⁺-type AlGaN layers. The developed deep-UV LED achieved an operating voltage of 10.8 V under a direct current (DC) operation of 63 A cm⁻², which is one of the lowest values among devices composed of AlGaN tunnel homojunctions. In addition, magnesium zinc oxide (MgZnO)/Al reflective electrodes were fabricated to enhance the output power of the AlGaN homoepitaxial TJ LED. The output power was increased to 57.3 mW under a 63 A cm⁻² DC operation, which was 1.7 times higher than that achieved using the conventional Ti/Al electrodes. The combination of the AlGaN-based TJ and MgZnO/Al reflective contact allows further improvement of the light output power. This study confirms that the AlGaN TJ is a promising UV-transmittance structure that can achieve a high light-extraction efficiency. Full article

We propose the use of an n-doped periodic AlN/GaN quantum cascade structure for the optical up-conversion of multiple near-infrared (near-IR) photons into deep-ultraviolet (deep-UV) radiation. Without applying an external bias voltage, the active region of such a device will (similar to an un-biased quantum cascade laser) resemble a sawtooth-shaped inter-subband structure. A carefully adjusted bias voltage then converts this sawtooth pattern into a ‘quantum-stair’. Illumination with λ = 1.55 µm radiation results in photon absorption thereby lifting electrons from the ground state of each main well into the first excited state. Three additional GaN quantum wells per period then provide by LO-phonon-assisted tunneling a diagonal transfer of these electrons towards the ground level of the neighboring period. From there, the next near-infrared (near-IR) photon absorption, electron excitation, and partial relaxation takes place. After 12 such absorption, transfer, and relaxation processes, the excited electrons have gained a sufficiently high amount of energy to undergo in the final AlN-based p-type contact layer an electron-hole band-to-band recombination. By employing this procedure, multiple near-IR photons will be up-converted to produce deep-UV radiation. Since for a wavelength of 1.55 µm very powerful near-IR pump lasers are readily available, such an up-conversion device will (even at a moderate overall conversion efficiency) potentially result in an equal or even higher output power than the one of an AlN-based p-n-junction light-emitting diode. The proposed structures are therefore very interesting for applications such as ultra-high-resolution photolithography or printing, water purification, medical equipment disinfection, white light generation, or the automotive industry. Full article

We report on the epitaxial lateral overgrowth (ELO) of high-quality AlN on stripe-patterned Si(111) substrates with various trench widths. By narrowing down the trench and ridge widths of patterned Si substrates, crack-free, 6-micrometer-thick, high-quality AlN films on Si substrates were produced. The full-width-at-half-maximum values of the X-ray-diffraction rocking curves for the AlN (0002) and (10$\overline{1}2$) planes were as low as 260 and 374 arcsec, respectively, corresponding to a record low dislocation density of 1.3 × 10⁹ cm⁻². Through the combination of a micro-Raman study and the X-ray diffraction analysis, it was found that narrowing the stripe width from 5 μm to 3 μm can reduce the vertical growth thickness before coalescence, resulting in a large decrease in the internal tensile stress and tilt angle, and, therefore, better suppression in the cracks and dislocations of the ELO–AlN. This work paves the way for the fabrication of high-performance Al(Ga)N-based thin-film devices such as ultraviolet light-emitting diodes and AlN bulk acoustic resonators grown on Si. Full article

AlGaN based deep ultraviolet (DUV) light-emitting diodes (LEDs), especially with a wavelength below 250 nm, have great application potential in the fields of sterilization and disinfection, gas sensing, and other aspects. However, with the decrease of emission wavelength, performance collapse occurs and the external quantum efficiencies (EQE) of sub-250 nm LEDs are usually below 1% for a long time. Low efficiencies are resulted from problem accumulation of all aspects, including n/p-type doping and contacts, carrier confinements and transports, light extraction, etc. To achieve high EQE of sub-250 nm LEDs, problems and solutions need to be discussed. In this paper, the research progress, development bottlenecks, and corresponding solutions of sub-250 nm LEDs are summarized and discussed in detail. Full article

In this work, an AlGaN-based Deep-Ultraviolet Light-Emitting Diode structure has been designed and simulated for the zincblende and wurtzite approaches, where the polarization effect is included. DFT analysis was performed to determine the band gap direct-to-indirect cross-point limit, AlN carrier mobility, and activation energies for p-type dopants. The multiple quantum wells analysis describes the emission in the deep-ultraviolet range without exceeding the direct-to-indirect bandgap cross-point limit of around 77% of Al content. Moreover, the quantum-confined Stark effect on wavefunctions overlapping has been studied, where Al-graded quantum wells reduce it. Both zincblende and wurtzite have improved electrical and optical characteristics by including a thin AlGaN with low Al content. Mg and Be acceptor activation energies have been calculated at 260 meV and 380 meV for Be and Mg acceptor energy, respectively. The device series resistance has been decreased by using Be instead of Mg as the p-type dopant from 3 kΩ to 0.7 kΩ. Full article

This paper reports an AlGaN-based ultraviolet-B light-emitting diode (UVB-LED) with a peak wavelength at 293 nm that was almost free of efficiency droop in the temperature range from 298 to 358 K. Its maximum external quantum efficiencies (EQEs), which were measured at a current density of 88.6 A cm^–2, when operated at 298, 318, and 338 K were 2.93, 2.84, and 2.76%, respectively; notably, however, the current droop (J-droop) in each of these cases was less than 1%. When the temperature was 358 K, the maximum EQE of 2.61% occurred at a current density of 63.3 A cm^–2, and the J-droop was 1.52%. We believe that the main mechanism responsible for overcoming the J-droop was the uniform distribution of the concentrations of injected electrons and holes within the multiple quantum wells. Through the subtle design of the p-type AlGaN layer, with the optimization of the composition and doping level, the hole injection efficiency was enhanced, and the Auger recombination mechanism was inhibited in an experimental setting. Full article

The trap states and defects near the active region in deep-ultraviolet (DUV) light-emitting diodes (LED) were investigated through wavelength-dependent photocurrent spectroscopy. We observed anomalous photocurrent reversal and its temporal recovery in AlGaN-based DUV LEDs as the wavelength of illuminating light varied from DUV to visible. The wavelength-dependent photocurrent measurements were performed on 265 nm-emitting DUV LEDs under zero-bias conditions. Sharp near-band-edge (~265 nm) absorption was observed in addition to broad (300–800 nm) visible-range absorption peaks in the photocurrent spectrum, while the current direction of these two peaks were opposite to each other. In addition, the current direction of the photocurrent in the visible wavelength range was reversed when a certain forward bias was applied. This bias-induced current reversal displayed a slow recovery time (~6 h) when the applied forward voltage was removed. Furthermore, the recovery time showed strong temperature dependency and was faster as the sample temperature increased. This result can be consistently explained by the presence of hole traps at the electron-blocking layer and the band bending caused by piezoelectric polarization fields. The activation energy of the defect state was calculated to be 279 meV using the temperature dependency of the recovery time. Full article

In order to achieve high quantum efficiency of AlGaN-based deep ultraviolet light-emitting diodes (UVC-LED), it is important to improve the light extraction efficiency (LEE). In this paper, theoretical simulation and experiment of SiO₂ anti-reflective film deposited on UVC-LED were investigated. The effect of different SiO₂ thickness on the light extraction efficiency of 275 nm UVC-LED was studied, showing that 140 nm SiO₂ anti-reflective film can effectively improve the light output power of UVC-LED by more than 5.5%, which were also confirmed by the TFCALC simulation. The enhancement of UVC-LED light extraction efficiency by this antireflective film is mainly due to the $\raisebox{1ex}{$3\mathsf{\lambda }$}\!\left/ \!\raisebox{-1ex}{$2$}\right.$ light coherent effect at the SiO₂/Al₂O₃ interface. Our work proved the promising application of antireflective coating on UVC-LED. Full article

Planar, nanopillar and Al nanosphere structure AlGaN-based deep-ultraviolet light-emitting diodes (DUV-LEDs) were numerically investigated via a three-dimensional finite difference time domain (3D FDTD) method. The three types of DUV-LEDs were compared and analyzed in terms of light extraction efficiency (LEE), Purcell factor (F_P) and modulation bandwidth. The results showed that nanopillar structure DUV-LEDs with optimal nanopillar height, width and spacing can enhance transverse electric (TE)-polarized LEE to 39.7% and transverse magnetic (TM)-polarized LEE to 4.4%. The remarkable improvement was mainly due to the increased scattering effect, decreased absorption of the p-GaN layer and total internal reflection (TIR) effect. After adopting the Al nanospheres, the TE-polarized modulation bandwidth was increased by 71 MHz and the TM-polarized LEE was enhanced approximately 4.3-fold as compared to the nanopillar LED structure, while the Al nanosphere diameter was 120 nm. The reasons for promotion are mainly attributed to the coupling behavior of diploe and localized surface plasmon induced by Al nanospheres. The designed structures provide a meaningful solution for realization of high-efficiency DUV-LEDs. Full article