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Nanomaterials
Special Issues
Nanomanufacturing Using Ion Beam Technology
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Nanomanufacturing Using Ion Beam Technology

A special issue of Nanomaterials (ISSN 2079-4991). This special issue belongs to the section "Nanofabrication and Nanomanufacturing".

Deadline for manuscript submissions: 20 May 2025 | Viewed by 630

Special Issue Editors

Dr. Mateus G. Masteghin

E-Mail Website
Guest Editor
National Centre for Nano Fabrication and Characterization, Technical University of Denmark, 2800 Kongens Lyngby, Denmark
Interests: nanofabrication; ion implantation; transmission electron microscopy; diffraction-based techniques
Dr. David Cox

E-Mail Website
Guest Editor
Advanced Technology Institute, University of Surrey, Guildford, Surrey GU2 7XH, UK
Interests: nanofabrication; ion implantation; ion beam metrology

Special Issue Information

Dear Colleagues,

For nearly five decades, focused ion beam (FIB) systems have played a pivotal role in advancing science across a wide range of fields, including materials science, metallurgy, electronic engineering, physics, and more recently, biology, with the integration of cryo-stages. While FIB technology is best known for its widespread use in cross-sectional analysis, transmission electron microscopy (TEM) lamella preparation, circuit repair, and time-of-flight secondary ion mass spectrometry (ToF-SIMS), its potential extends far beyond these conventional applications.

This Special Issue of Nanomaterials is dedicated to exploring niche and emerging applications of FIB systems. We invite contributions that highlight innovative uses of FIB technology, such as ion implantation for quantum technologies, material property modification (e.g., phase change and stress), selective etching and deposition for nanoelectronics, ion beam-based nanometrology, and other cutting-edge techniques. Our aim is to showcase the versatility and capabilities of FIB systems, fostering broader adoption across research and industry. We also hope that these contributions will drive further improvements in FIB technology itself, from system upgrades to the development of new capabilities. Leading research groups working on non-conventional FIB applications are especially encouraged to submit their work.

We look forward to receiving your contributions, which will provide a comprehensive overview of FIB technology and inspire new research avenues.

Dr. Mateus G. Masteghin
Dr. David Cox
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Nanomaterials is an international peer-reviewed open access semimonthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2400 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • focused ion beam
  • nanofabrication
  • ion implantation
  • selective etching and deposition
  • ion impurities
  • nanometrology

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Published Papers (1 paper)

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Review

13 pages, 5601 KiB  
Review
Ordering Enhancement of Ion Bombardment-Induced Nanoripple Patterns: A Review
by Ying Liu, Hengbo Li, Chongyu Wang, Gaoyuan Yang, Frank Frost and Yilin Hong
Nanomaterials 2025, 15(6), 438; https://doi.org/10.3390/nano15060438 - 13 Mar 2025
Viewed by 381
Abstract
Low-energy ion bombardment (IB) has emerged as a promising, maskless nanofabrication tool for quasi-periodic nanoripples, marked by a high throughput and low cost. As templates, these IB-induced, self-organized surface nanoripples have shown potential for applications in diverse fields. However, the challenge of tailoring [...] Read more.
Low-energy ion bombardment (IB) has emerged as a promising, maskless nanofabrication tool for quasi-periodic nanoripples, marked by a high throughput and low cost. As templates, these IB-induced, self-organized surface nanoripples have shown potential for applications in diverse fields. However, the challenge of tailoring the ordering of these ripple patterns is preventing the widespread application of IB. Moreover, the enhancement of the ordering of these self-organized nanostructures involves the fundamental academic questions of nanoripple coupling (or superimposition) and guided self-organization. This review first focuses on the experimental progress made in developing representative strategies for the ordering enhancement of IB-induced nanoripples in terms of ion beams and targets. Second, we present our understanding of these developments from the perspectives of ripple superposition and guided self-organization. In particular, the basic conditions for ripple superposition under the non-conservation of mass are deduced based on the common features of the results from rocking bombardments of a single material and the bombardment of bilayer systems, providing insight into the mechanisms at play and deepening our understanding of these experimental observations. Finally, areas for future research are given, with the aim of improving ripple ordering from the viewpoints of ripple superimposition and guided self-organization. All this may re-stimulate interest in this field and will be of importance in advancing the academic research and practical applications of IB-induced nanopatterns. Full article
(This article belongs to the Special Issue Nanomanufacturing Using Ion Beam Technology)
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