Semiconductor Thin Films: Preparation, Properties, and Applications
A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Thin Films".
Deadline for manuscript submissions: closed (20 August 2023) | Viewed by 226
Special Issue Editors
Interests: metal oxide semiconductors; thin film deposition and characterization; solution processing; negative capacitance field effect trannsistors; ferroelectric thin films
Special Issue Information
Dear Colleagues,
This Special Issue, entitled “Semiconductor Thin Films: Preparation, Properties, and Applications”, is focused towards enriching the existing literature on the semiconductor thin films and their preparation using various new or improved existing technologies. Semiconductors are the heart of thin film electronics, and their processing is the key to realizing high-performance devices such as thin-film transistors. Various classes of semiconductors possess their own advantages and challenges: the organic small mole varieties have environmental degradation issues; metal chalcogenides face challenges in large area deposition; multicomponent amorphous metal oxides have issues related to bias instability, with surfaces prone to moisture adsorption. Thus, designing these semiconductors for advances display and logic applications is essential. In view of these needs and challenges, this Special Issue is targeted towards understanding these challenges and finding solutions from researchers all over the world.
Dr. Pavan Pujar
Dr. Junxia Shi
Guest Editors
Manuscript Submission Information
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Keywords
- functional oxide ceramics
- metal oxide semiconductors
- organic semiconductors
- negative capacitance field effect transistors
- semiconductor processing
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