Investigation of Thin Films Using UV-X-Ray Reflectometry
A special issue of Applied Sciences (ISSN 2076-3417). This special issue belongs to the section "Materials Science and Engineering".
Deadline for manuscript submissions: closed (10 December 2021) | Viewed by 2111
Special Issue Editor
Special Issue Information
Dear Colleagues,
UV-X-Ray reflectometry is a powerful tool for the structural characterization of thin films and layered systems. Often coupled with other techniques such as spectroscopic ellipsometry, profilometry, X-ray diffraction, atomic force microscopy (AFM) or X-ray photoelectron spectroscopy (XPS), this technique can be very useful for the determination of the thickness, density, and roughness parameters of layered systems. Two are the most important peculiarities: it is not destructive and can also be applied to insulating materials. In particular, in proximity to the absorption edges, reflectance measurements can give important informations on the physical and chemical state of films and relative interfaces. Important applications are for instance organic and magnetic films. Polarized light reflectivity can be used to follow the growth and to characterize ultrathin organic layers at surfaces and to determine the molecular arrangement and electronic structure of strongly oriented organic ultrathin films. Additionally, X-ray magnetic reflectivity in resonant conditions is a very powerful probe of magnetic films, allowing to extract the interfacial magnetization profiles with nanometer resolution. With the help of an adequate modelization of the system, reflectometry represents an important tool for depth profiling or quality control of thin single or layered systems. In this Special Issue, we explore recent progress and new directions in the use of UV-X-Ray reflectometry for the study of thin films and buried interfaces.
Dr. Angelo Giglia
Guest Editor
Manuscript Submission Information
Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.
Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Applied Sciences is an international peer-reviewed open access semimonthly journal published by MDPI.
Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2400 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.
Keywords
- thin films
- UV-X-Ray Reflectometry
- buried interfaces
- depth profiling
- organic films
- magnetic films
