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Nanomanufacturing, Volume 4, Issue 2
2024 June - 3 articles
Cover Story: Individually addressable nano-LED structures can form the basis for unprecedented fast and flexible patterning, on demand, in photo-chemically sensitive films. Here, we report on developments in mask-free lithography approaches based on nano-LED devices and summarize current achievements in the different building blocks needed for its application. We introduce a driving scheme for nano-LEDs in arrays enabling singular addressability. Furthermore, we discuss the challenges facing nano-LED fabrication and possibilities to improve their performance. We conclude with an explaination of how this technique could be further developed for next-generation lithography systems exhibiting the potential to revolutionize the field and to significantly contribute to energy- and resource-saving device nanomanufacturing. View this paper
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Nanomanufacturing - ISSN 2673-687X