A High-Flux Compact X-ray Free-Electron Laser for Next-Generation Chip Metrology Needs
Abstract
:1. Introduction
2. The Ultracompact X-ray Free-Electron Laser: Background and Status
3. Recent Cryogenic Photoinjector Development
4. The Challenge of Ptychographic Laminography
5. Extending the UCXFEL to High-Flux Hard X-ray, High-Coherence Operation
Linear Accelerator Design Evolution
6. High-Gradient Accelerating Cavity Testing
7. Injection into the Booster Linac and BBU Effects
SRWF-Induced Emittance Dilution
8. IFEL Modulation and Beam Compression
8.1. Very-High-Frequency RF Devices for Bunch Compression
8.2. Long-Range BBU Effects after First Compression
8.3. Undulator Resistive Wall Wakefield Mitigation
9. X-ray Regenerative Amplifier FEL Performance
10. Conclusions and Outlook for Chip Metrology XFEL Development
- Engage with imaging community and industrial users to set photon flux and spectral quality demands for ptychographic laminography chip inspection;
- Examine advantages of cryo-emission through measurements at emerging UCLA infrastructure;
- Finalize high-brightness RF gun technical approach based on cryo-RF experimental results;
- Fabricate new C-band linear accelerator sections with optimized power distribution requiring quadrant symmetry;
- Perform high-gradient testing of two-cell structures and one-meter linac sections at room temperature to achieve 100 MeV/m gradients;
- Perform cost optimization of RF and linear accelerator systems based on preliminary engineering design to determine technical choice for industrialized instrument;
- Optimize alignment and mechanical stability systems as well as active correctors for orbits;
- Consider beamline layout and design, including transport magnet systems, vacuum systems, and advanced transverse and longitudinal beam diagnostic systems;
- Quantify pulse–pulse variation beam quality, stability, and reproducibility as is critically important for image reconstruction;
- Reexamine XRAFEL design for increased spectral brightness and consistency with optimized ptychographic application;
- Design short-period cryogenic undulator with strong focusing and beam/radiation diagnostic systems;
- Consider X-ray optics design and engineering development for both XRAFEL and ptychography systems;
- Industrialize accelerator and FEL technical approach, including RF, cryogenic systems. This is in progress at RadiaBeam in the context of the present collaboration;
- Address the role of end station and detector technology. Consider the design, development, and integration of the ptychographic laminography system for industrial-scale chip metrology with collaborators from imaging community and the semiconductor industry;
- Integrate algorithm and big data challenges from ptychographic laminography into system design;
- Perform preliminary cost analysis of developing a prototype XRAFEL for chip metrology, with fully capable end station for fast inspection in the industrial environment.
Author Contributions
Funding
Data Availability Statement
Acknowledgments
Conflicts of Interest
References
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Parameter | Units | 1 μm Value | 3 μm Value |
---|---|---|---|
Modulator peak magnetic field | T | 0.265 | 0.477 |
Modulator laser peak power | MW | 200 | 80 |
Modulator laser waist size | mm | 0.5 | 0.5 |
Final chicane bend angle | degrees | 0.855 | 1.66 |
Parameter | Units | Value |
---|---|---|
Energy | GeV | 2.44 |
Energy spread | % | 0.03 |
Normalized transverse emittance | nm-rad | 75 |
Peak current | kA | 4.0 |
Undulator parameter, K | 0.501 | |
Undulator period | mm | 6.5 |
Undulator length | m | 4.0 |
Fundamental FEL wavelength | Å | 1.783 |
Photon energy | keV | 6.95 |
Diamond (220) bandwidth | meV | 141 |
Cavity round-trip length (time) | m (ns) | 12 (40) |
Number of electron bunches in an RF pulse | 8 |
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Rosenzweig, J.B.; Andonian, G.; Agustsson, R.; Anisimov, P.M.; Araujo, A.; Bosco, F.; Carillo, M.; Chiadroni, E.; Giannessi, L.; Huang, Z.; et al. A High-Flux Compact X-ray Free-Electron Laser for Next-Generation Chip Metrology Needs. Instruments 2024, 8, 19. https://doi.org/10.3390/instruments8010019
Rosenzweig JB, Andonian G, Agustsson R, Anisimov PM, Araujo A, Bosco F, Carillo M, Chiadroni E, Giannessi L, Huang Z, et al. A High-Flux Compact X-ray Free-Electron Laser for Next-Generation Chip Metrology Needs. Instruments. 2024; 8(1):19. https://doi.org/10.3390/instruments8010019
Chicago/Turabian StyleRosenzweig, James B., Gerard Andonian, Ronald Agustsson, Petr M. Anisimov, Aurora Araujo, Fabio Bosco, Martina Carillo, Enrica Chiadroni, Luca Giannessi, Zhirong Huang, and et al. 2024. "A High-Flux Compact X-ray Free-Electron Laser for Next-Generation Chip Metrology Needs" Instruments 8, no. 1: 19. https://doi.org/10.3390/instruments8010019