Article Versions Notes

Rosenzweig JB, Andonian G, Agustsson R, Anisimov PM, Araujo A, Bosco F, Carillo M, Chiadroni E, Giannessi L, Huang Z, et al. A High-Flux Compact X-ray Free-Electron Laser for Next-Generation Chip Metrology Needs. Instruments. 2024; 8(1):19. https://doi.org/10.3390/instruments8010019

Rosenzweig, James B., Gerard Andonian, Ronald Agustsson, Petr M. Anisimov, Aurora Araujo, Fabio Bosco, Martina Carillo, Enrica Chiadroni, Luca Giannessi, Zhirong Huang, and et al. 2024. "A High-Flux Compact X-ray Free-Electron Laser for Next-Generation Chip Metrology Needs" Instruments 8, no. 1: 19. https://doi.org/10.3390/instruments8010019

Rosenzweig, J. B., Andonian, G., Agustsson, R., Anisimov, P. M., Araujo, A., Bosco, F., Carillo, M., Chiadroni, E., Giannessi, L., Huang, Z., Fukasawa, A., Kim, D., Kutsaev, S., Lawler, G., Li, Z., Majernik, N., Manwani, P., Maxson, J., Miao, J., ... Yadav, M. (2024). A High-Flux Compact X-ray Free-Electron Laser for Next-Generation Chip Metrology Needs. Instruments, 8(1), 19. https://doi.org/10.3390/instruments8010019