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- Rosenzweig, J. B.
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- Andonian, G.
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- Anisimov, P. M.
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- Andonian, G.
- Agustsson, R.
- Anisimov, P. M.
- Araujo, A.
- Bosco, F.
- Carillo, M.
- Chiadroni, E.
- Giannessi, L.
- Huang, Z.
- Fukasawa, A.
- Kim, D.
- Kutsaev, S.
- Lawler, G.
- Li, Z.
- Majernik, N.
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- Maxson, J.
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- Migliorati, M.
- Mostacci, A.
- Musumeci, P.
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- Nanni, E.
- O’Tool, S.
- Palumbo, L.
- Robles, R.
- Sakai, Y.
- Simakov, E. I.
- Singleton, M.
- Spataro, B.
- Tang, J.
- Tantawi, S.
- Williams, O.
- Xu, H.
- Yadav, M.
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Journal: Instruments, 2024
Volume: 8
Number: 19
19
Article:
A High-Flux Compact X-ray Free-Electron Laser for Next-Generation Chip Metrology Needs
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James B. Rosenzweig, Gerard Andonian, Ronald Agustsson, Petr M. Anisimov, Aurora Araujo, Fabio Bosco, Martina Carillo, Enrica Chiadroni, Luca Giannessi, Zhirong Huang, Atsushi Fukasawa, Dongsung Kim, Sergey Kutsaev, Gerard Lawler, Zenghai Li, Nathan Majernik, Pratik Manwani, Jared Maxson, Janwei Miao, Mauro Migliorati, Andrea Mostacci, Pietro Musumeci, Alex Murokh, Emilio Nanni, Sean O’Tool, Luigi Palumbo, River Robles, Yusuke Sakai, Evgenya I. Simakov, Madison Singleton, Bruno Spataro, Jingyi Tang, Sami Tantawi, Oliver Williams, Haoran Xu and Monika Yadavadd
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Cite
Rosenzweig, J.B.; Andonian, G.; Agustsson, R.; Anisimov, P.M.; Araujo, A.; Bosco, F.; Carillo, M.; Chiadroni, E.; Giannessi, L.; Huang, Z.; et al. A High-Flux Compact X-ray Free-Electron Laser for Next-Generation Chip Metrology Needs. Instruments 2024, 8, 19. https://doi.org/10.3390/instruments8010019
Rosenzweig JB, Andonian G, Agustsson R, Anisimov PM, Araujo A, Bosco F, Carillo M, Chiadroni E, Giannessi L, Huang Z, et al. A High-Flux Compact X-ray Free-Electron Laser for Next-Generation Chip Metrology Needs. Instruments. 2024; 8(1):19. https://doi.org/10.3390/instruments8010019
Chicago/Turabian StyleRosenzweig, James B., Gerard Andonian, Ronald Agustsson, Petr M. Anisimov, Aurora Araujo, Fabio Bosco, Martina Carillo, Enrica Chiadroni, Luca Giannessi, Zhirong Huang, and et al. 2024. "A High-Flux Compact X-ray Free-Electron Laser for Next-Generation Chip Metrology Needs" Instruments 8, no. 1: 19. https://doi.org/10.3390/instruments8010019
APA StyleRosenzweig, J. B., Andonian, G., Agustsson, R., Anisimov, P. M., Araujo, A., Bosco, F., Carillo, M., Chiadroni, E., Giannessi, L., Huang, Z., Fukasawa, A., Kim, D., Kutsaev, S., Lawler, G., Li, Z., Majernik, N., Manwani, P., Maxson, J., Miao, J., ... Yadav, M. (2024). A High-Flux Compact X-ray Free-Electron Laser for Next-Generation Chip Metrology Needs. Instruments, 8(1), 19. https://doi.org/10.3390/instruments8010019
