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Morales C, Mahmoodinezhad A, Tschammer R, Kosto J, Alvarado Chavarin C, Schubert MA, Wenger C, Henkel K, Flege JI. Combination of Multiple Operando and In-Situ Characterization Techniques in a Single Cluster System for Atomic Layer Deposition: Unraveling the Early Stages of Growth of Ultrathin Al₂O₃ Films on Metallic Ti Substrates. Inorganics. 2023; 11(12):477. https://doi.org/10.3390/inorganics11120477

Morales, Carlos, Ali Mahmoodinezhad, Rudi Tschammer, Julia Kosto, Carlos Alvarado Chavarin, Markus Andreas Schubert, Christian Wenger, Karsten Henkel, and Jan Ingo Flege. 2023. "Combination of Multiple Operando and In-Situ Characterization Techniques in a Single Cluster System for Atomic Layer Deposition: Unraveling the Early Stages of Growth of Ultrathin Al₂O₃ Films on Metallic Ti Substrates" Inorganics 11, no. 12: 477. https://doi.org/10.3390/inorganics11120477

Morales, C., Mahmoodinezhad, A., Tschammer, R., Kosto, J., Alvarado Chavarin, C., Schubert, M. A., Wenger, C., Henkel, K., & Flege, J. I. (2023). Combination of Multiple Operando and In-Situ Characterization Techniques in a Single Cluster System for Atomic Layer Deposition: Unraveling the Early Stages of Growth of Ultrathin Al₂O₃ Films on Metallic Ti Substrates. Inorganics, 11(12), 477. https://doi.org/10.3390/inorganics11120477