Sánchez Vergara, M.E.; Ramirez, S.B.; Alanis, R.L.; RamÃrez, G.M.d.O.; Baeza Alvarado, M.D.; Fomina, L.; Rios, C.; Salcedo, R.
Deposit and Characterization of Semiconductor Films Based on Maleiperinone and Polymeric Matrix of (Poly(3,4-Ethylenedioxythiophene) Polystyrene Sulfonate). Processes 2021, 9, 1776.
https://doi.org/10.3390/pr9101776
AMA Style
Sánchez Vergara ME, Ramirez SB, Alanis RL, RamÃrez GMdO, Baeza Alvarado MD, Fomina L, Rios C, Salcedo R.
Deposit and Characterization of Semiconductor Films Based on Maleiperinone and Polymeric Matrix of (Poly(3,4-Ethylenedioxythiophene) Polystyrene Sulfonate). Processes. 2021; 9(10):1776.
https://doi.org/10.3390/pr9101776
Chicago/Turabian Style
Sánchez Vergara, MarÃa Elena, Sergio Barrientos Ramirez, Rafael Loaiza Alanis, Georgina Montes de Oca RamÃrez, MarÃa Dolores Baeza Alvarado, Lioudmila Fomina, Citlalli Rios, and Roberto Salcedo.
2021. "Deposit and Characterization of Semiconductor Films Based on Maleiperinone and Polymeric Matrix of (Poly(3,4-Ethylenedioxythiophene) Polystyrene Sulfonate)" Processes 9, no. 10: 1776.
https://doi.org/10.3390/pr9101776
APA Style
Sánchez Vergara, M. E., Ramirez, S. B., Alanis, R. L., RamÃrez, G. M. d. O., Baeza Alvarado, M. D., Fomina, L., Rios, C., & Salcedo, R.
(2021). Deposit and Characterization of Semiconductor Films Based on Maleiperinone and Polymeric Matrix of (Poly(3,4-Ethylenedioxythiophene) Polystyrene Sulfonate). Processes, 9(10), 1776.
https://doi.org/10.3390/pr9101776