Zhang, Z.; Qi, R.; Yao, Y.; Shi, Y.; Li, W.; Huang, Q.; Yi, S.; Zhang, Z.; Wang, Z.; Xie, C.
Improving Thickness Uniformity of Mo/Si Multilayers on Curved Spherical Substrates by a Masking Technique. Coatings 2019, 9, 851.
https://doi.org/10.3390/coatings9120851
AMA Style
Zhang Z, Qi R, Yao Y, Shi Y, Li W, Huang Q, Yi S, Zhang Z, Wang Z, Xie C.
Improving Thickness Uniformity of Mo/Si Multilayers on Curved Spherical Substrates by a Masking Technique. Coatings. 2019; 9(12):851.
https://doi.org/10.3390/coatings9120851
Chicago/Turabian Style
Zhang, Zhe, Runze Qi, Yiyun Yao, Yingna Shi, Wenbin Li, Qiushi Huang, Shengzhen Yi, Zhong Zhang, Zhanshan Wang, and Chun Xie.
2019. "Improving Thickness Uniformity of Mo/Si Multilayers on Curved Spherical Substrates by a Masking Technique" Coatings 9, no. 12: 851.
https://doi.org/10.3390/coatings9120851
APA Style
Zhang, Z., Qi, R., Yao, Y., Shi, Y., Li, W., Huang, Q., Yi, S., Zhang, Z., Wang, Z., & Xie, C.
(2019). Improving Thickness Uniformity of Mo/Si Multilayers on Curved Spherical Substrates by a Masking Technique. Coatings, 9(12), 851.
https://doi.org/10.3390/coatings9120851