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Journal: Coatings, 2025
Volume: 15
Number: 1181

Article: Structural and Electrical Properties of Si-Doped β-Ga2O3 Thin Films Deposited by RF Sputtering: Effects of Oxygen Flow Ratio and Post-Annealing Temperature
Authors: by Haechan Kim, Yuta Kubota, Nobuhiro Matsushita, Gonjae Lee and Jeongsoo Hong
Link: https://www.mdpi.com/2079-6412/15/10/1181

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