Wang, X.; Zhang, Y.; Zhang, X.; Lin, Z.; Liu, D.; Hong, C.; Dai, P.
Evolutions of the Microstructure and Properties of the (CrMoNbTaZr)NX Films Prepared by Reactive Magnetron Sputtering: Effects of Stoichiometry and Crystallinity. Coatings 2023, 13, 1424.
https://doi.org/10.3390/coatings13081424
AMA Style
Wang X, Zhang Y, Zhang X, Lin Z, Liu D, Hong C, Dai P.
Evolutions of the Microstructure and Properties of the (CrMoNbTaZr)NX Films Prepared by Reactive Magnetron Sputtering: Effects of Stoichiometry and Crystallinity. Coatings. 2023; 13(8):1424.
https://doi.org/10.3390/coatings13081424
Chicago/Turabian Style
Wang, Xiang, Yanhong Zhang, Xin Zhang, Zhihe Lin, Dongguang Liu, Chunfu Hong, and Pinqiang Dai.
2023. "Evolutions of the Microstructure and Properties of the (CrMoNbTaZr)NX Films Prepared by Reactive Magnetron Sputtering: Effects of Stoichiometry and Crystallinity" Coatings 13, no. 8: 1424.
https://doi.org/10.3390/coatings13081424
APA Style
Wang, X., Zhang, Y., Zhang, X., Lin, Z., Liu, D., Hong, C., & Dai, P.
(2023). Evolutions of the Microstructure and Properties of the (CrMoNbTaZr)NX Films Prepared by Reactive Magnetron Sputtering: Effects of Stoichiometry and Crystallinity. Coatings, 13(8), 1424.
https://doi.org/10.3390/coatings13081424