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Journal: CoatingsVolume: 13Number: 1070
Article: Study on the Deposition Characteristics of Molybdenum Thin Films Deposited by the Thermal Atomic Layer Deposition Method Using MoO2Cl2 as a Precursor
- Authors:
- Baek-Ju Lee*,
- Kyu-Beom Lee and
- Jae-Wook Choi
- et al.
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