Article Versions Notes

Hsieh ST, Mishra H, Bolouki N, Wu W, Li C, Hsieh J-H. The Correlation of Plasma Characteristics to the Deposition Rate of Plasma Polymerized Methyl Methacrylate Thin Films in an Inductively Coupled Plasma System. Coatings. 2022; 12(7):1014. https://doi.org/10.3390/coatings12071014

Hsieh, Stephen T., Himanshu Mishra, Nima Bolouki, Weite Wu, Chuan Li, and Jang-Hsing Hsieh. 2022. "The Correlation of Plasma Characteristics to the Deposition Rate of Plasma Polymerized Methyl Methacrylate Thin Films in an Inductively Coupled Plasma System" Coatings 12, no. 7: 1014. https://doi.org/10.3390/coatings12071014

Hsieh, S. T., Mishra, H., Bolouki, N., Wu, W., Li, C., & Hsieh, J.-H. (2022). The Correlation of Plasma Characteristics to the Deposition Rate of Plasma Polymerized Methyl Methacrylate Thin Films in an Inductively Coupled Plasma System. Coatings, 12(7), 1014. https://doi.org/10.3390/coatings12071014