Borwornpornmetee, N.; Charoenyuenyao, P.; Chaleawpong, R.; Paosawatyanyong, B.; Phatthanakun, R.; Sittimart, P.; Aramaki, K.; Hamasaki, T.; Yoshitake, T.; Promros, N.
Physical Properties of Fe3Si Films Coated through Facing Targets Sputtering after Microwave Plasma Treatment. Coatings 2021, 11, 923.
https://doi.org/10.3390/coatings11080923
AMA Style
Borwornpornmetee N, Charoenyuenyao P, Chaleawpong R, Paosawatyanyong B, Phatthanakun R, Sittimart P, Aramaki K, Hamasaki T, Yoshitake T, Promros N.
Physical Properties of Fe3Si Films Coated through Facing Targets Sputtering after Microwave Plasma Treatment. Coatings. 2021; 11(8):923.
https://doi.org/10.3390/coatings11080923
Chicago/Turabian Style
Borwornpornmetee, Nattakorn, Peerasil Charoenyuenyao, Rawiwan Chaleawpong, Boonchoat Paosawatyanyong, Rungrueang Phatthanakun, Phongsaphak Sittimart, Kazuki Aramaki, Takeru Hamasaki, Tsuyoshi Yoshitake, and Nathaporn Promros.
2021. "Physical Properties of Fe3Si Films Coated through Facing Targets Sputtering after Microwave Plasma Treatment" Coatings 11, no. 8: 923.
https://doi.org/10.3390/coatings11080923
APA Style
Borwornpornmetee, N., Charoenyuenyao, P., Chaleawpong, R., Paosawatyanyong, B., Phatthanakun, R., Sittimart, P., Aramaki, K., Hamasaki, T., Yoshitake, T., & Promros, N.
(2021). Physical Properties of Fe3Si Films Coated through Facing Targets Sputtering after Microwave Plasma Treatment. Coatings, 11(8), 923.
https://doi.org/10.3390/coatings11080923