Ko, E.; Lee, J.; Ryu, S.-W.; Shin, H.; Park, S.; Ko, D.-H.
Effect of Ge Concentration on the On-Current Boosting of Logic P-Type MOSFET with Sigma-Shaped Source/Drain. Coatings 2021, 11, 654.
https://doi.org/10.3390/coatings11060654
AMA Style
Ko E, Lee J, Ryu S-W, Shin H, Park S, Ko D-H.
Effect of Ge Concentration on the On-Current Boosting of Logic P-Type MOSFET with Sigma-Shaped Source/Drain. Coatings. 2021; 11(6):654.
https://doi.org/10.3390/coatings11060654
Chicago/Turabian Style
Ko, Eunjung, Juhee Lee, Seung-Wook Ryu, Hyunsu Shin, Seran Park, and Dae-Hong Ko.
2021. "Effect of Ge Concentration on the On-Current Boosting of Logic P-Type MOSFET with Sigma-Shaped Source/Drain" Coatings 11, no. 6: 654.
https://doi.org/10.3390/coatings11060654
APA Style
Ko, E., Lee, J., Ryu, S.-W., Shin, H., Park, S., & Ko, D.-H.
(2021). Effect of Ge Concentration on the On-Current Boosting of Logic P-Type MOSFET with Sigma-Shaped Source/Drain. Coatings, 11(6), 654.
https://doi.org/10.3390/coatings11060654