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Volume 11
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10.3390/coatings11101251
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Article

Formation of Aligned α-Si3N4 Microfibers by Plasma Nitridation of Si (110) Substrate Coated with SiO2

by
Chang-Hua Yu
1,*,
Kun-An Chiu
1,
Thi-Hien Do
1,
Li Chang
1,* and
Wei-Chun Chen
2
1
Department of Materials Science and Engineering, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan
2
National Applied Research Laboratories, Taiwan Instrument Research Institute, Hsinchu 30010, Taiwan
*
Authors to whom correspondence should be addressed.
Coatings 2021, 11(10), 1251; https://doi.org/10.3390/coatings11101251
Submission received: 18 August 2021 / Revised: 6 October 2021 / Accepted: 7 October 2021 / Published: 14 October 2021
(This article belongs to the Section Ceramic Coatings and Engineering Technology)
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Abstract

Plasma nitridation of an amorphous SiO2 layer on Si (110) substrate can form well-aligned α-Si3N4 crystallites in fibrous morphology. Nitriding is performed at a temperature in the range of 800–1000 °C by using microwave plasma with a gas mixture of N2 and H2. Raman spectroscopy shows the characteristics of an α-Si3N4 phase without other crystalline nitrides. As shown by scanning electron microscopy, the formed α-Si3N4 microfibers on the Si substrate can be in a dense and straight array nearly along with Si <11¯0>, and can have a length over 2 mm with a diameter in the range of 5–10 μm. Structural characterization of scanning transmission electron microscopy in cross section view reveals that the elongated α-Si3N4 crystallites are formed on the surface of the nitrided SiO2/Si (110) substrate without any interlayers between Si3N4 and Si, and the longitudinal direction of α-Si3N4 appears mainly along <112¯0>, which is approximately parallel to Si <11¯0>.
Keywords: Si3N4; plasma; nitridation; fiber; electron microscopy Si3N4; plasma; nitridation; fiber; electron microscopy

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MDPI and ACS Style

Yu, C.-H.; Chiu, K.-A.; Do, T.-H.; Chang, L.; Chen, W.-C. Formation of Aligned α-Si3N4 Microfibers by Plasma Nitridation of Si (110) Substrate Coated with SiO2. Coatings 2021, 11, 1251. https://doi.org/10.3390/coatings11101251

AMA Style

Yu C-H, Chiu K-A, Do T-H, Chang L, Chen W-C. Formation of Aligned α-Si3N4 Microfibers by Plasma Nitridation of Si (110) Substrate Coated with SiO2. Coatings. 2021; 11(10):1251. https://doi.org/10.3390/coatings11101251

Chicago/Turabian Style

Yu, Chang-Hua, Kun-An Chiu, Thi-Hien Do, Li Chang, and Wei-Chun Chen. 2021. "Formation of Aligned α-Si3N4 Microfibers by Plasma Nitridation of Si (110) Substrate Coated with SiO2" Coatings 11, no. 10: 1251. https://doi.org/10.3390/coatings11101251

APA Style

Yu, C.-H., Chiu, K.-A., Do, T.-H., Chang, L., & Chen, W.-C. (2021). Formation of Aligned α-Si3N4 Microfibers by Plasma Nitridation of Si (110) Substrate Coated with SiO2. Coatings, 11(10), 1251. https://doi.org/10.3390/coatings11101251

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