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Journal: Coatings, 2021
Volume: 11
Number: 7

Article: Effect of Voltage Pulse Width and Synchronized Substrate Bias in High-Power Impulse Magnetron Sputtering of Zirconium Films
Authors: by Chin-Chiuan Kuo, Chun-Hui Lin, Jing-Tang Chang and Yu-Tse Lin
Link: https://www.mdpi.com/2079-6412/11/1/7

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