Hubička, Z.; Zlámal, M.; Olejníček, J.; Tvarog, D.; Čada, M.; Krýsa, J.
Semiconducting p-Type Copper Iron Oxide Thin Films Deposited by Hybrid Reactive-HiPIMS + ECWR and Reactive-HiPIMS Magnetron Plasma System. Coatings 2020, 10, 232.
https://doi.org/10.3390/coatings10030232
AMA Style
Hubička Z, Zlámal M, Olejníček J, Tvarog D, Čada M, Krýsa J.
Semiconducting p-Type Copper Iron Oxide Thin Films Deposited by Hybrid Reactive-HiPIMS + ECWR and Reactive-HiPIMS Magnetron Plasma System. Coatings. 2020; 10(3):232.
https://doi.org/10.3390/coatings10030232
Chicago/Turabian Style
Hubička, Zdenek, Martin Zlámal, Jiri Olejníček, Drahoslav Tvarog, Martin Čada, and Josef Krýsa.
2020. "Semiconducting p-Type Copper Iron Oxide Thin Films Deposited by Hybrid Reactive-HiPIMS + ECWR and Reactive-HiPIMS Magnetron Plasma System" Coatings 10, no. 3: 232.
https://doi.org/10.3390/coatings10030232
APA Style
Hubička, Z., Zlámal, M., Olejníček, J., Tvarog, D., Čada, M., & Krýsa, J.
(2020). Semiconducting p-Type Copper Iron Oxide Thin Films Deposited by Hybrid Reactive-HiPIMS + ECWR and Reactive-HiPIMS Magnetron Plasma System. Coatings, 10(3), 232.
https://doi.org/10.3390/coatings10030232