Article Versions Notes

Kim S-W, Yoo J-H, Park W-J, Lee C-H, Lee J-H, Kim J-H, Uhm S-H, Lee H-C. Enhancing Charge Trapping Performance of Hafnia Thin Films Using Sequential Plasma Atomic Layer Deposition. Nanomaterials. 2024; 14(20):1686. https://doi.org/10.3390/nano14201686

Kim, So-Won, Jae-Hoon Yoo, Won-Ji Park, Chan-Hee Lee, Joung-Ho Lee, Jong-Hwan Kim, Sae-Hoon Uhm, and Hee-Chul Lee. 2024. "Enhancing Charge Trapping Performance of Hafnia Thin Films Using Sequential Plasma Atomic Layer Deposition" Nanomaterials 14, no. 20: 1686. https://doi.org/10.3390/nano14201686

Kim, S.-W., Yoo, J.-H., Park, W.-J., Lee, C.-H., Lee, J.-H., Kim, J.-H., Uhm, S.-H., & Lee, H.-C. (2024). Enhancing Charge Trapping Performance of Hafnia Thin Films Using Sequential Plasma Atomic Layer Deposition. Nanomaterials, 14(20), 1686. https://doi.org/10.3390/nano14201686