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Journal: Nanomaterials, 2023
Volume: 13
Number: 161

Article: Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
Authors: by Boyun Choi, Hyeong-U Kim and Nari Jeon
Link: https://www.mdpi.com/2079-4991/13/1/161

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