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Journal: Nanomaterials, 2022
Volume: 12
Number: 1739
Article:
On the Vertically Stacked Gate-All-Around Nanosheet and Nanowire Transistor Scaling beyond the 5 nm Technology Node
Authors:
by
Hei Wong and Kuniyuki Kakushima
Link:
https://www.mdpi.com/2079-4991/12/10/1739
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