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Journal: Nanomaterials, 2021
Volume: 11
Number: 955
Article:
Investigate on the Mechanism of HfO2/Si0.7Ge0.3 Interface Passivation Based on Low-Temperature Ozone Oxidation and Si-Cap Methods
Authors:
by
Qide Yao, Xueli Ma, Hanxiang Wang, Yanrong Wang, Guilei Wang, Jing Zhang, Wenkai Liu, Xiaolei Wang, Jiang Yan, Yongliang Li and Wenwu Wang
Link:
https://www.mdpi.com/2079-4991/11/4/955
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