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Journal: Applied SciencesVolume: 15Number: 1573
Article: Defect Tailoring in HfO2/Si Films upon Post-Deposition Annealing and Ultraviolet Irradiation
- Authors:
- Silvestre Salas-Rodríguez1,
- Fernanda I. González-Moreno2 and
- Rosa M. Woo-García3
- et al.
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