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Journal: Appl. Sci., 2025
Volume: 15
Number: 1573
1573
Article: Defect Tailoring in HfO₂/Si Films upon Post-Deposition Annealing and Ultraviolet Irradiation
Authors: by Silvestre Salas-Rodríguez, Fernanda I. González-Moreno, Rosa M. Woo-García, Agustín L. Herrera-May, Francisco López-Huerta and Felipe Caballero-Briones
Link: https://www.mdpi.com/2076-3417/15/3/1573

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